Dr. Heiko Feldmann
Principal at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Mirrors, Optical design, Lithographic illumination, Imaging systems, Scanners, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, EUV optics

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Artificial intelligence, Charge-coupled devices, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

Proceedings Article | 2 April 2011 Paper
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Particles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Airborne remote sensing

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Metrology, Imaging systems, Scanners, Photons, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Zone plates, EUV optics

Proceedings Article | 19 July 2006 Paper
Proc. SPIE. 6342, International Optical Design Conference 2006
KEYWORDS: Chromatic aberrations, Lithography, Mirrors, Optical design, Diffractive optical elements, Lenses, Calcium, Lens design, Colorimetry, Combined lens-mirror systems

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top