Dr. Helen Cottle Profile

Dr. Helen Cottle

Etch Process Engineer at Tel Technology Ctr America LLC

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Publications (3)

Proceedings Article | 27 April 2017 Presentation

Overcoming etch challenges related to EUV based patterning (Conference Presentation)

Andrew Metz, Hongyun Cottle, Masanobu Honda, Shinya Morikita, Kaushik Kumar, Peter Biolsi

Proceedings Volume 10149, 1014906 (2017) https://doi.org/10.1117/12.2258153

KEYWORDS: Photoresist processing, Extreme ultraviolet, Optical lithography, Line edge roughness, Line width roughness, Etching, Plasma etching, Plasma, Process control, Ecosystems

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Proceedings Article | 4 April 2016 Paper

DSA via hole shrink for advanced node applications

Cheng Chi, Chi-Chun Liu, Luciana Meli, Kristin Schmidt, Yongan Xu, Ekmini Anuja DeSilva, Martha Sanchez, Richard Farrell, Hongyun Cottle, Daiji Kawamura, Lovejeet Singh, Tsuyoshi Furukawa, Kafai Lai, Jed Pitera, Daniel Sanders, David Hetzer, Andrew Metz, Nelson Felix, John Arnold, Matthew Colburn

Proceedings Volume 9777, 97770L (2016) https://doi.org/10.1117/12.2219706

KEYWORDS: Directed self assembly, Polymethylmethacrylate, Picosecond phenomena, Etching, Global Positioning System, Critical dimension metrology, Optical lithography, Lithography, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 23 March 2016 Paper

Plasma etch patterning of EUV lithography: balancing roughness and selectivity trade off

Vinayak Rastogi, Genevieve Beique, Lei Sun, Hongyun Cottle, Yannick Feurprier, Andrew Metz, Kaushik Kumar, Cathy Labelle, John Arnold, Matthew Colburn, Alok Ranjan

Proceedings Volume 9782, 97820B (2016) https://doi.org/10.1117/12.2216840

KEYWORDS: Line edge roughness, Line width roughness, Plasma etching, Plasma, Etching, Optical lithography, Extreme ultraviolet, Photoresist processing, Extreme ultraviolet lithography, Lithography, Materials processing, Ions, Chemistry

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