CONFERENCE PROCEEDINGS
Advanced Search
Hendrik Ketelaars
at FastMicro B.V.
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 22 November 2023 Poster
Next generation particle detection metrology tool for EUV pellicles and mask backside defectivity control
Hans Arts, Hendrik Ketelaars
Proceedings Volume PC12751, PC1275112 (2023) https://doi.org/10.1117/12.3007936
KEYWORDS: Pellicles, Particles, Metrology, Extreme ultraviolet, Scanners, Semiconducting wafers, Yield improvement, Reticles, Photomask technology, Particle contamination
Proceedings Article | 16 November 2022 Presentation
Applicability Fastmicro product scanner as particle detection metrology tool
Proceedings Volume PC12293, PC1229305 (2022) https://doi.org/10.1117/12.2641788
KEYWORDS: Particles, Scanners, Metrology, Semiconducting wafers, Yield improvement, Reticles, Pellicles, Particle contamination, Opto mechatronics
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top