Dr. Hendrik Steigerwald Profile

Dr. Hendrik Steigerwald

Program Manager Blank Reticle Inspection at KLA MIE GmbH

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Publications (10)

Proceedings Article | 16 September 2022 Paper

High-precision and cost-effective EUV reticle defect registration with integrated grid matching using KLA LMS IPRO and FlashScan

P. Y. Portnichenko, F. Oezdogan, L. Dawahre, O. Lohse, B. Kalsbeck, P. Jain, H. Steigerwald, S. Ismail, F. Laske

Proceedings Volume 12325, 123250E (2022) https://doi.org/10.1117/12.2642100

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Metrology, Reticles, Optical alignment, Particles, Manufacturing, Defect inspection

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Proceedings Article | 20 October 2021 Presentation + Paper

High-precision and cost-effective EUV reticle defect registration with integrated grid matching using KLA LMS IPRO and FlashScan

P. Portnichenko, F. Oezdogan, L. Dawahre, O. Lohse, B. Kalsbeck, P. Jain, H. Steigerwald, S. Ismail, F. Laske

Proceedings Volume 11855, 1185504 (2021) https://doi.org/10.1117/12.2600957

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Metrology, Reticles, Optical alignment, Particles, Manufacturing, Defect inspection, Silicon

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Proceedings Article | 12 October 2018 Presentation

Fast local registration measurements for efficient e-beam writer qualification and correction: EMLC18 Best Paper (Conference Presentation)

Klaus-Dieter Roeth, Hendrik Steigerwald, Runyuan Han, Oliver Ache, Frank Laske

Proceedings Volume 10810, 108100A (2018) https://doi.org/10.1117/12.2506286

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Mask manufacturers are facing major reticle metrology challenges, driving the need for cost‐effective solutions that provide tighter registration specifications and on‐device registration qualification. E‐beam mask writers’ local registration error may have a critical impact on the error contribution of the reticles to wafer overlay, as it is very local and most likely is not revealed with standard quality control schemes and sampling. The reticle error signatures are, of course, writing‐strategy‐dependent, but may also be caused by residual deflector alignment issues, thus leading to a very local but potentially critical non‐correctable overlay error on the wafer. Since the e‐beam writer strategy does not differ significantly between ArFi masks and EUV masks, we expect a similar error signature for both mask types. We will present data which demonstrates local registration errors that can be correlated to the writing swathes of state‐of‐the‐art e‐beam writers and multi‐pass strategies, potentially leading to systematic device registration errors versus design of close to 2nm. Furthermore, error signatures for local charging and process effects are indicated by local registration measurements resulting in systematic error, also on the order of 2nm. A unique measurement methodology, Local Registration Metrology, is presented that allows for dense sampling of reticle dies to characterize the local e‐beam registration error. Several thousand sites in a region of interest with length and width of a few hundred microns are measured. LMS IPRO metrology algorithms enable parallel registration measurement of all individual sites for fast and accurate metrology. High throughput allows completion of Local Registration measurement within a few minutes instead of exceeding a day of measurement time with conventional registration metrology strategies. This capability enables mask users to add local registration quality control to ensure the local wafer pattern placement error contribution by a mask is within the acceptable tolerance. In addition, based on the results of Local Registration Metrology, e‐beam mask writer corrections via feed forward can now be developed to significantly reduce local overlay error on wafer caused by the reticles.

Proceedings Article | 19 September 2018 Paper

Fast local registration measurements for efficient e-beam writer qualification and correction

Klaus-Dieter Roeth, Hendrik Steigerwald, Runyuan Han, Oliver Ache, Frank Laske

Proceedings Volume 10775, 107750G (2018) https://doi.org/10.1117/12.2325627

KEYWORDS: Reticles, Photomasks, Image registration, Semiconducting wafers, Extreme ultraviolet, Overlay metrology, Metrology, Manufacturing, Lithography

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Proceedings Article | 12 June 2018 Paper

Enabling accurate and cost-effective registration metrology on EUVL masks

Runyuan Han, Hendrik Steigerwald, Frank Laske, Klaus-Dieter Roeth

Proceedings Volume 10807, 108070M (2018) https://doi.org/10.1117/12.2325128

KEYWORDS: Extreme ultraviolet, Metrology, Photomasks, Extreme ultraviolet lithography, Overlay metrology, Semiconducting wafers, Reticles

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Proceedings Article | 13 March 2018 Paper

LMS IPRO: Enabling local registration measurements for efficient e-beam writer correction

Hendrik Steigerwald, Oliver Ache, Runyuan Han, Frank Laske, Klaus-Dieter Roeth

Proceedings Volume 10585, 105851V (2018) https://doi.org/10.1117/12.2303959

KEYWORDS: Reticles, Photomasks, Image registration, Semiconducting wafers, Extreme ultraviolet, Metrology, Overlay metrology, Manufacturing, Time metrology, Lithography

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Proceedings Article | 13 July 2017 Paper

LMS IPRO: enabling accurate registration metrology on SiN-based phase-shift masks

Hendrik Steigerwald, Runyuan Han, Alexander Buettner, Klaus-Dieter Roeth

Proceedings Volume 10454, 104540V (2017) https://doi.org/10.1117/12.2279676

KEYWORDS: Metrology, Photomasks, Optical lithography, Immersion lithography, Air contamination, Optical properties, Detection and tracking algorithms, High volume manufacturing

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Proceedings Article | 17 October 2014 Paper

Bringing mask repair to the next level

K. Edinger, K. Wolff, H. Steigerwald, N. Auth, P. Spies, J. Oster, H. Schneider, M. Budach, T. Hofmann, M. Waiblinger

Proceedings Volume 9235, 92350R (2014) https://doi.org/10.1117/12.2072474

KEYWORDS: Photomasks, Ion beams, Ions, Chemistry, Electron beams, Quartz, Etching, Molecules, Image resolution, Extreme ultraviolet

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Proceedings Article | 13 July 2007 Paper

CO₂ laser free-form processing of hard tissue

Martin Werner, Manfred Klasing, Mikhail Ivanenko, Daniela Harbecke, Hendrik Steigerwald, Peter Hering

Proceedings Volume 6632, 663202 (2007) https://doi.org/10.1117/12.728436

KEYWORDS: Bone, Gas lasers, Laser tissue interaction, Pulsed laser operation, Laser processing, Laser ablation, Carbon monoxide, Laser therapeutics, Tissues, Laser dentistry

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Proceedings Article | 6 February 2007 Paper

CO2 laser milling of hard tissue

Martin Werner, Mikhail Ivanenko, Daniela Harbecke, Manfred Klasing, Hendrik Steigerwald, Peter Hering

Proceedings Volume 6435, 64350E (2007) https://doi.org/10.1117/12.699055

KEYWORDS: Laser tissue interaction, Bone, Gas lasers, Laser ablation, Pulsed laser operation, Tissues, Laser drilling, Carbon monoxide, Laser therapeutics, Laser systems engineering

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Showing 5 of 10 publications

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