Mr. Heng-Hsin Liu Profile

Heng-Hsin Liu

Dept Manager at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 31 March 2014 Paper

Estimation of 1D proximity budget impacts due to light source for advanced node design

H. Liu, R. Peng, Tony Wu

Proceedings Volume 9052, 90521I (2014) https://doi.org/10.1117/12.2047373

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Optical lithography, Laser stabilization, Optical simulations, Light sources, Lithography, Panoramic photography, Laser applications, Laser optics

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Process requirements for pitch splitting LELE double patterning at advanced logic technology node

H. J. Lee, I. Huang, Ivan Lalovic, John Lin, Allen Chang, Arthur Lin, H. Liu, R. Peng, Benjamin Szu-Min Lin

Proceedings Volume 8326, 83260X (2012) https://doi.org/10.1117/12.916420

KEYWORDS: Double patterning technology, Critical dimension metrology, Etching, Lithography, Optical lithography, Photomasks, Photoresist materials, Logic, Optical simulations, Cadmium

Read Abstract +

Proceedings Article | 2 April 2010 Paper

A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography

C. Ke, John Lin, Spencer Lin, H. Liu, Jon Wu, Willie Wang, Andreas Fuchs, Kaustuve Bhattacharyya, Sophie Peng, Mir Shahrjerdy, Gavin Liu, Cathy Wang, Maurits van der Schaar, G. Huang, Noelle Wright, W. Yang, L. Chen, Marc Noot, Victor Shih, Vivien Wang, Omer Adam, Jim Chen, Jacky Huang, T. Gau, L. Terng, Wei-Shun Tzeng, C. Liang, H. Lee, Sophia Wang

Proceedings Volume 7638, 76383P (2010) https://doi.org/10.1117/12.853318

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Scanners, Back end of line, Lithography, 3D metrology, Finite element methods, Scatterometry, Critical dimension metrology

Read Abstract +

Proceedings Article | 12 December 2009 Paper

Model-based scanner tuning for process optimization

C. Y. Shih, Tsung-Chih Chien, R. Goossens, R. Aldana, W. J. Shao, R. C. Peng, H. J. Lee, Simon Hsieh, C. H. Chang, C. M. Wu, John Lin, W. H. Hung, H. C. Wu, Y. Cao, K. W. Chang, X. Xie, Y. C. Chen, H. H. Liu, Tommy Lee

Proceedings Volume 7520, 75201Q (2009) https://doi.org/10.1117/12.842551

KEYWORDS: Scanners, Semiconducting wafers, Calibration, Lithography, Yield improvement, Model-based design, Data modeling, Wafer-level optics, Optimization (mathematics), Process modeling

Read Abstract +

Proceedings Article | 11 December 2009 Paper

A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography

Andreas Fuchs, Willie Wang, Jacky Huang, L. G. Terng, Vivien Wang, H. H. Liu, L. J. Chen, Alan Ho, Omer Adam, Maurits van der Schaar, John Lin, Sophia Wang, H. J. Lee, W. T. Yang, Jon Wu, Mir Shahrjerdy, G. T. Huang, H. L. Chung, Noelle Wright, Dennis Chang, Victor Shih, Sophie Peng, T. S. Gau, Chih-Ming Ke, C. R. Liang, Kaustuve Bhattacharyya, Spencer Lin, Karel van der Mast, Cathy Wang

Proceedings Volume 7520, 75201A (2009) https://doi.org/10.1117/12.837353

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Lithography, Back end of line, Metals, Scatterometry, Front end of line, Signal to noise ratio

Read Abstract +

Proceedings Article | 24 March 2009 Paper

A scatterometry based CD metrology solution for advanced nodes, including capability of handling birefringent layers with uniaxial anisotropy

Jimmy Hu, Wim Coene, Kaustuve Bhattacharyya, H. J. Lee, Jacky Huang, Karel van der Mast, Marc Noot, Y. Fan, H. H. Liu, Tony Yen, Noelle Wright, Vivien Wang, Chih-Ming Ke, Willie Wang, Victor Shih, H. Chung, John Lin, Kiwi Yuan, C. R. Liang, Ruben Alvarez Sanchez

Proceedings Volume 7272, 72723R (2009) https://doi.org/10.1117/12.814909

KEYWORDS: Anisotropy, Semiconducting wafers, Scatterometry, Finite element methods, Critical dimension metrology, Birefringence, Absorption, Refractive index, Carbon, Lithography

Read Abstract +

Proceedings Article | 23 March 2009 Paper

Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography

Kiwi Yuan, C. Liang, Willie Wang, Vivien Wang, Andreas Fuchs, Y. Fan, Karel van der Mast, H. Chung, Mir Shahrjerdy, Jacky Huang, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Chih-Ming Ke, Cathy Wang, H. Liu, Spencer Lin, Noelle Wright, Jimmy Hu, H. Lee, Victor Shih

Proceedings Volume 7272, 72720A (2009) https://doi.org/10.1117/12.814860

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Semiconducting wafers, Critical dimension metrology, Lithography, Finite element methods, Photomasks, Scanners, Double patterning technology

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Model-based scanner tuning in a manufacturing environment

H. Cao, C. H. Chang, Y. Cao, K. W. Chang, R. Goossens, W. J. Shao, T. C. Chien, Y. W. Guo, Simon Hsieh, A. Bruguier, R. Aldana, P. C. Huang, H. H. Liu, C. Y. Shih, H. J. Lee, C. L. Chang, R. C. Peng, X. Xie, J. Y. Lee, John Lin, C. P. Yeh

Proceedings Volume 7274, 72740T (2009) https://doi.org/10.1117/12.813974

KEYWORDS: Scanners, Semiconducting wafers, Data modeling, Calibration, Lithography, Manufacturing, Model-based design, Optical proximity correction, Wafer-level optics, Reticles

Read Abstract +

Proceedings Article | 4 December 2008 Paper

CD control enhancement by laser bandwidth stabilization for advanced lithography application

K. W. Chang, H. Lee, Benjamin Lin, R. Peng, Allen Chang, H. Liu, John Lin, C. P. Yeh, Tony Wu

Proceedings Volume 7140, 714041 (2008) https://doi.org/10.1117/12.804616

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Laser stabilization, Gas lasers, Signal processing, Beam controllers, Control systems, Laser applications, Lithography, Photoresist materials

Read Abstract +

Proceedings Article | 1 December 2008 Paper

A comprehensive look at a new metrology technique to support the needs of lithography performance in near future

C. R. Liang, Karel van der Mast, Vivien Wang, Kaustuve Bhattacharyya, Victor Shih, Mir Shahrjerdy, Maurits van der Schaar, Kiwi Yuan, Jimmy Hu, Jacky Huang, H. Liu, Andreas Fuchs, Willie Wang, Cathy Wang, H. J. Lee, H. L. Chung, Chih-Ming Ke, L. G. Terng, Y. D. Fan

Proceedings Volume 7140, 71400N (2008) https://doi.org/10.1117/12.807998

KEYWORDS: Overlay metrology, Metrology, Lithography, Semiconducting wafers, Scatterometry, Photomasks, Feedback control, Optical lithography, Scanners

Read Abstract +

Proceedings Article | 27 March 2007 Paper

Effects of laser bandwidth on iso-dense bias and line-end shortening at sub-micron process nodes

R. Peng, H. Liu, John Lin, Y. Guo, A. Yang, L. Chen

Proceedings Volume 6520, 65203S (2007) https://doi.org/10.1117/12.713080

KEYWORDS: Laser energy, Semiconducting wafers, Laser scanners, 3D scanning, Lithography, Etching, Critical dimension metrology, Metrology, Scanning electron microscopy, Laser applications

Read Abstract +