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Henk W. Van Zeijl
Process Engineer at Technische Univ Delft
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Publications (4)
Proceedings Article | 30 December 2004 Paper
3D Align overlay verification using glass wafers
Proceedings Volume 5641, (2004) https://doi.org/10.1117/12.573807
KEYWORDS: Glasses, Semiconducting wafers, Overlay metrology, Optical alignment, Silicon, 3D metrology, Lithography, Reflectivity, Microelectromechanical systems, Phase modulation
Proceedings Article | 16 August 2004 Paper
Characterization of waferstepper and process-related front- to backwafer overlay errors in bulk micromachining using electrical overlay test structures
Henk van Zeijl, Frans Bijnen, John Slabbekoorn
Proceedings Volume 5455, (2004) https://doi.org/10.1117/12.545900
KEYWORDS: Semiconducting wafers, Resistors, Overlay metrology, Optical alignment, Etching, Calibration, Resistance, Wafer-level optics, Bulk micromachining, Tin
Proceedings Article | 24 April 2003 Paper
Characterization of front- to backwafer alignment and bulk micromachining using electrical overlay test structures
Henk van Zeijl, John Slabbekoorn
Proceedings Volume 5116, (2003) https://doi.org/10.1117/12.499104
KEYWORDS: Optical alignment, Resistors, Overlay metrology, Semiconducting wafers, Etching, Tin, Bulk micromachining, Anisotropic etching, Lithography, Silicon
Proceedings Article | 18 August 2000 Paper
Backwafer optical lithography and wafer distortion in substrate transfer technologies
Henk Van Zeijl, J. Slabbekoorn, L. Nanver, Paul Van Dijk, Axel Berthold, T. Machielsen
Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395730
KEYWORDS: Semiconducting wafers, Overlay metrology, Optical alignment, Mirrors, Optical lithography, Silicon, Lithography
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