Mr. Henning Muellerke Profile

Henning Muellerke

at Synopsys GmbH

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Publications (2)

Proceedings Article | 30 July 2002 Paper

Accuracy of new analytical models for resist formation lithography

Juriy Malov, Christian Kalus, Henning Muellerke, Thomas Schmoeller, Robert Wildfeuer

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474506

KEYWORDS: 3D modeling, Photoresist processing, Absorption, 3D image processing, Lithography, Process modeling, Optical lithography, Algorithm development, Diffusion, Photoresist materials

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Proceedings Article | 5 July 2000 Paper

Impact of high-order aberrations on the performance of the aberration monitor

Peter Dirksen, Casper Juffermans, Andre Engelen, Peter De Bisschop, Henning Muellerke

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389010

KEYWORDS: Monochromatic aberrations, Spherical lenses, Sodium, Interferometry, 3D modeling, Scanners, Deep ultraviolet, Data modeling, Scanning electron microscopy, Optical lithography

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