Prof. Henry N. Chapman Profile

Prof. Henry N. Chapman

Physicist at Ctr for Free-Electron Laser Science

SPIE Involvement:

Author

Publications (46)

Proceedings Article | 8 July 2021 Open Access

Open Access

Paper

On the use of multilayer Laue lenses with X-ray free electron lasers

Mauro Prasciolu, Kevin Murray, Nikolay Ivanov, Holger Fleckenstein, Martin Domaracký, Luca Gelisio, Fabian Trost, Kartik Ayyer, Dietrich Krebs, Steve Aplin, Salah Awel, Ulrike Boesenberg, Grega Belšak, Anton Barty, Armando Estillore, Matthias Fuchs, Yaroslav Gevorkov, Joerg Hallmann, Chan Kim, Juraj Knoška, Jochen Küpper, Chufeng Li, Wei Lu, Valerio Mariani, Andrew Morgan, Johannes Möller, Anders Madsen, Dominik Oberthür, Gisel Peña Murillo, David Reis, Markus Scholz, Božidar Šarler, Pablo Villanueva-Perez, Oleksandr Yefanov, Kara Zielinski, Alexey Zozulya, Henry Chapman, Saša Bajt

Proceedings Volume 11886, 118860M (2021) https://doi.org/10.1117/12.2592229

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Proceedings Article | 10 November 2016 Presentation

Presentation

Development of a photophoretic optical guide for femtosecond x-ray diffractive imaging of aerosolized nanoparticles (Conference Presentation)

Richard Kirian, Salah Awel, Max Wiedorn, Daniel Horke, Nils Roth, Niko Eckerskorn, Jochen Küpper, Henry Chapman, Andrei Rode

Proceedings Volume 9922, 99220K (2016) https://doi.org/10.1117/12.2239171

KEYWORDS: X-ray diffraction, X-rays, Femtosecond phenomena, X-ray imaging, Nanoparticles, Atmospheric particles, Radiation effects, Particles, X-ray optics, Free electron lasers

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Proceedings Article | 21 September 2015 Paper

Paper

Image reconstruction in serial femtosecond nanocrystallography using x-ray free-electron lasers

Joe P. J. Chen, Richard Kirian, Kenneth Beyerlein, Richard Bean, Andrew Morgan, Oleksandr Yefanov, Romain Arnal, David Wojtas, Phil Bones, Henry Chapman, John C. H. Spence, Rick Millane

Proceedings Volume 9600, 960002 (2015) https://doi.org/10.1117/12.2187610

KEYWORDS: Crystals, X-rays, Crystallography, Molecules, Phase retrieval, Electrons, X-ray imaging, Nanocrystals, Femtosecond phenomena, Free electron lasers

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Proceedings Article | 25 August 2015 Presentation + Paper

Presentation + Paper

Toward steering a jet of particles into an x-ray beam with optically induced forces

Niko Eckerskorn, Richard Bowman, Richard Kirian, Salah Awel, Max Wiedorn, Jochen Küpper, Miles Padgett, Henry Chapman, Andrei Rode

Proceedings Volume 9548, 95480H (2015) https://doi.org/10.1117/12.2191442

KEYWORDS: Particles, Atmospheric particles, X-rays, Glasses, Optical tweezers, Calibration, X-ray optics, Spherical lenses, Molecules, Solids

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Proceedings Article | 12 May 2015 Paper

Paper

Implications of the focal beam profile in serial femtosecond crystallography

Lorenzo Galli, Peter Metcalf, Henry Chapman

Proceedings Volume 9511, 95110H (2015) https://doi.org/10.1117/12.2182654

KEYWORDS: Crystals, X-rays, Laser crystals, Diffraction, Crystallography, Femtosecond phenomena, X-ray diffraction, Free electron lasers, Photonic crystals, X-ray imaging

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Proceedings Article | 12 May 2015 Paper

Paper

Diffraction gratings based on asymmetric-cut multilayers

Mauro Prasciolu, Henry Chapman, Saša Bajt

Proceedings Volume 9510, 95100S (2015) https://doi.org/10.1117/12.2178246

KEYWORDS: Multilayers, Silicon, Diffraction gratings, Polishing, Coating, Silica, X-rays, Etching, Surface roughness, Wet etching

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Proceedings Article | 12 September 2013 Paper

Paper

Quasi-Bessel hollow beam as optical guide for micro-particles

Li Li, Niko Eckerskorn, Richard Kirian, Jochen Kuper, Daniel DePonte, W. Krolikowski, W. Lee, Henry Chapman, Andrei Rode

Proceedings Volume 8810, 88100N (2013) https://doi.org/10.1117/12.2026654

KEYWORDS: Particles, Bessel beams, Spatial light modulators, Axicons, Free electron lasers, X-rays, Beam propagation method, Aerodynamics, Spiral phase plates, Molecules

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Proceedings Article | 3 May 2013 Paper

Paper

Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm

Adam F. Leontowich, Andrew Aquila, Francesco Stellato, Richard Bean, Holger Fleckenstein, Mauro Prasciolu, Mengning Liang, Daniel DePonte, Anton Barty, Fenglin Wang, Jakob Andreasson, Janos Hajdu, Henry Chapman, Saša Bajt

Proceedings Volume 8777, 87770T (2013) https://doi.org/10.1117/12.2022403

KEYWORDS: Multilayers, Free electron lasers, Photomicroscopy, Polymethylmethacrylate, Optical testing, Signal attenuation, Mirrors, Reflectivity, Photons, X-ray optics

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Proceedings Article | 19 October 2012 Paper

Paper

Profiling structured beams using injected aerosols

N. Loh, Dmitri Starodub, Lukas Lomb, Christina Hampton, Andrew Martin, Raymond Sierra, Anton Barty, Andrew Aquila, Joachim Schulz, Jan Steinbrener, Robert Shoeman, Stephan Kassemeyer, Christoph Bostedt, John Bozek, Sascha Epp, Benjamin Erk, Robert Hartmann, Daniel Rolles, Artem Rudenko, Benedikt Rudek, Lutz Foucar, Nils Kimmel, Georg Weidenspointner, Günther Hauser, Peter Holl, Emanuele Pedersoli, MengNing Liang, Mark Hunter, Lars Gumprecht, Nicola Coppola, Cornelia Wunderer, Heinz Graafsman, Filipe R. N. Maia, Tomas Ekeberg, Max Hantke, Holger Fleckenstein, Helmut Hirsemann, Karol Nass, Thomas White, Herbert Tobias, George Farquar, W. Henry Benner, Stefan Hau-Riege, Christian Reich, Andreas Hartmann, Heike Soltau, Stefano Marchesini, Sasa Bajt, Miriam Barthelmess, Lothar Strueder, Joachim Ullrich, Philip Bucksbaum, Keith Hodgson, Mathias Frank, Ilme Schlichting, Henry Chapman, Michael Bogan

Proceedings Volume 8504, 850403 (2012) https://doi.org/10.1117/12.930075

KEYWORDS: Optical spheres, Free electron lasers, Diffraction, Sensors, Photons, Profiling, X-rays, Wavefronts, Aerosols, Scattering

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Proceedings Article | 17 October 2012 Paper

Paper

Modeling of XFEL induced ionization and atomic displacement in protein nanocrystals

Carl Caleman, Nicusor Tîmneanu, Andrew Martin, Thomas White, Howard Scott, Anton Barty, Andrew Aquila, Henry Chapman

Proceedings Volume 8504, 85040H (2012) https://doi.org/10.1117/12.929294

KEYWORDS: X-rays, Ionization, Proteins, Crystals, Electrons, Free electron lasers, Plasma, Crystallography, Femtosecond phenomena, Nanocrystals

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Proceedings Article | 21 May 2011 Paper

Paper

Single particle imaging with soft x-rays at the Linac Coherent Light Source

Andrew Martin, Jakob Andreasson, Andrew Aquila, Saša Bajt, Thomas R. Barends, Miriam Barthelmess, Anton Barty, W. Henry Benner, Christoph Bostedt, John Bozek, Phillip Bucksbaum, Carl Caleman, Nicola Coppola, Daniel DePonte, Tomas Ekeberg, Sascha Epp, Benjamin Erk, George Farquar, Holger Fleckenstein, Lutz Foucar, Matthias Frank, Lars Gumprecht, Christina Hampton, Max Hantke, Andreas Hartmann, Elisabeth Hartmann, Robert Hartmann, Stephan Hau-Riege, Günther Hauser, Peter Holl, André Hoemke, Olof Jönsson, Stephan Kassemeyer, Nils Kimmel, Maya Kiskinova, Faton Krasniqi, Jacek Krzywinski, Mengning Liang, Ne-Te Duane Loh, Lukas Lomb, Filipe R. N. Maia, Stefano Marchesini, Marc Messerschmidt, Karol Nass, Duško Odic, Emanuele Pedersoli, Christian Reich, Daniel Rolles, Benedikt Rudek, Artem Rudenko, Carlo Schmidt, Joachim Schultz, M. Marvin Seibert, Robert Shoeman, Raymond Sierra, Heike Soltau, Dmitri Starodub, Jan Steinbrener, Francesco Stellato, Lothar Strüder, Martin Svenda, Herbert Tobias, Joachim Ullrich, Georg Weidenspointner, Daniel Westphal, Thomas White, Garth Williams, Janos Hajdu, Ilme Schlichting, Michael Bogan, Henry Chapman

Proceedings Volume 8078, 807809 (2011) https://doi.org/10.1117/12.886754

KEYWORDS: Diffraction, Particles, X-rays, Light sources, Sensors, Liquid crystal lasers, X-ray imaging, X-ray diffraction, Coherence imaging, Free electron lasers

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Proceedings Article | 21 May 2011 Paper

Paper

Sample injection for pulsed x-ray sources

Daniel DePonte, Karol Nass, Francesco Stellato, Mengning Liang, Henry Chapman

Proceedings Volume 8078, 80780M (2011) https://doi.org/10.1117/12.886780

KEYWORDS: Liquids, Particles, Free electron lasers, X-rays, Aerosols, Aerodynamics, Diffraction, Atmospheric particles, X-ray sources, Lenses

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Proceedings Article | 19 May 2011 Paper

Paper

X-ray laser-induced ablation of lead compounds

V. Hájková, L. Juha, P. Boháček, T. Burian, J. Chalupský, L. Vyšín, J. Gaudin, P. Heimann, S. Hau-Riege, M. Jurek, D. Klinger, J. Pelka, R. Sobierajski, J. Krzywinski, M. Messerschmidt, S. Moeller, B. Nagler, M. Rowen, W. Schlotter, M. Swiggers, J. Turner, S. Vinko, T. Whitcher, J. Wark, M. Matuchová, S. Bajt, H. Chapman, T. Dzelzainis, D. Riley, J. Andreasson, J. Hajdu, B. Iwan, N. Timneanu, K. Saksl, R. Fäustlin, A. Singer, K. Tiedtke, S. Toleikis, I. Vartaniants, H. Wabnitz

Proceedings Volume 8077, 807718 (2011) https://doi.org/10.1117/12.890134

KEYWORDS: X-rays, Liquid crystal lasers, Laser ablation, Lead, Free electron lasers, Signal attenuation, Extreme ultraviolet, X-ray lasers, Laser damage threshold, Polymethylmethacrylate

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Proceedings Article | 29 September 2009 Paper

Paper

Perspective for high energy density studies on x-ray FELs

R. Lee, B. Nagler, U. Zastrau, R. Fäustlin, S. Vinko, T. Whitcher, R. Sobierajski, J. Krzywinski, L. Juha, A. Nelson, S. Bajt, K. Budil, R. Cauble, T. Bornath, T. Burian, J. Chalupsky, H. Chapman, J. Cihelka, T. Döppner, T. Dzelzainis, S. Düsterer, M. Fajardo, E. Förster, C. Fortmann, S. Glenzer, S. Göde, G. Gregori, V. Hajkova, P. Heimann, M. Jurek, F. Khattak, A. Khorsand, D. Klinger, M. Kozlova, T. Laarmann, H.-J. Lee, K.-H. Meiwes-Broer, P. Mercere, W. Murphy, A. Przystawik, R. Redmer, H. Reinholz, D. Riley, G. Röpke, K. Saksl, R. Thiele, J. Tiggesbäumker, S. Toleikis, T. Tschentscher, I. Uschmann, R. Falcone, R. Shepherd, J. Hastings, W. White, J. Wark

Proceedings Volume 7451, 74510E (2009) https://doi.org/10.1117/12.825349

KEYWORDS: Free electron lasers, X-rays, Extreme ultraviolet, Electrons, Absorption, Luminescence, Liquid crystal lasers, Photons, Fusion energy, Chemical species

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Proceedings Article | 18 May 2009 Paper

Paper

Optical emission spectroscopy of various materials irradiated by soft x-ray free-electron laser

J. Cihelka, L. Juha, J. Chalupský, F. Rosmej, O. Renner, K. Saksl, V. Hájková, L. Vyšin, E. Galtier, R. Schott, A. Khorsand, D. Riley, T. Dzelzainis, A. Nelson, R. Lee, P. Heimann, B. Nagler, S. Vinko, J. Wark, T. Whitcher, S. Toleikis, T. Tschentscher, R. Faustlin, H. Wabnitz, S. Bajt, H. Chapman, J. Krzywinski, R. Sobierajski, D. Klinger, M. Jurek, J. Pelka, S. Hau-Riege, R. London, J. Kuba, N. Stojanovic, K. Sokolowski-Tinten, A. Gleeson, M. Störmer, J. Andreasson, J. Hajdu, N. Timneanu

Proceedings Volume 7361, 73610P (2009) https://doi.org/10.1117/12.822766

KEYWORDS: Aluminum, Plasma, Silicon, Ions, Free electron lasers, Copper, Chemical species, Spectroscopy, Mirrors, Emission spectroscopy

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Proceedings Article | 18 May 2009 Paper

Paper

Sub-micron focusing of soft x-ray free electron laser beam

S. Bajt, H. Chapman, A. Nelson, R. Lee, S. Toleikis, P. Mirkarimi, J. Alameda, S. Baker, H. Vollmer, R. Graff, A. Aquila, E. Gullikson, J. Meyer Ilse, E. Spiller, J. Krzywinski, L. Juha, J. Chalupský, V. Hájková, J. Hajdu, T. Tschentscher

Proceedings Volume 7361, 73610J (2009) https://doi.org/10.1117/12.822498

KEYWORDS: Reflectivity, Carbon, Contamination, Mirrors, Plasma, Oxygen, Free electron lasers, Wavefronts, X-rays, Diffraction

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Proceedings Article | 18 May 2007 Paper

Paper

Damage-resistant single-pulse optics for x-ray free electron lasers

Stefan Hau-Riege, Richard London, Michael Bogan, Henry Chapman, Magnus Bergh

Proceedings Volume 6586, 65860T (2007) https://doi.org/10.1117/12.723994

KEYWORDS: Singular optics, Silicon, Mirrors, Free electron lasers, X-ray optics, X-rays, Multilayers, Laser damage threshold, Reflectivity, Optical spheres

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Proceedings Article | 18 May 2007 Paper

Paper

Multilayers for next-generation x-ray sources

S. Bajt, H. Chapman, E. Spiller, S. Hau-Riege, J. Alameda, A. Nelson, C. Walton, B. Kjornrattanawanich, A. Aquila, F. Dollar, E. Gullikson, C. Tarrio, S. Grantham

Proceedings Volume 6586, 65860J (2007) https://doi.org/10.1117/12.724786

KEYWORDS: Reflectivity, Mirrors, Multilayers, Free electron lasers, Silicon, X-ray optics, X-rays, X-ray sources, Coating, Optical components

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Proceedings Article | 7 September 2006 Paper

Paper

A new apparatus for serial crystallography at the Advanced Light Source

David Shapiro, R. Bruce Doak, John Spence, Dmitri Starodub, Uwe Weierstall, Henry Chapman

Proceedings Volume 6318, 63180L (2006) https://doi.org/10.1117/12.680785

KEYWORDS: X-rays, Crystallography, Diffraction, Proteins, X-ray diffraction, Particles, Molecules, Light sources, Sensors, Capillaries

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Proceedings Article | 8 September 2005 Paper

Paper

Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems

Kenneth Goldberg, Patrick Naulleau, Senajith Rekawa, Paul Denham, J. Liddle, Eric Gullikson, Keith Jackson, Erik Anderson, John Taylor, Gary Sommargren, Henry Chapman, Donald Phillion, Michael Johnson, Anton Barty, Regina Soufli, Eberhard Spiller, Christopher Walton, Sasa Bajt

Proceedings Volume 5900, 59000G (2005) https://doi.org/10.1117/12.618066

KEYWORDS: Extreme ultraviolet, Optical testing, Interferometry, EUV optics, X-ray optics, X-rays, Lenses, Light sources, Astronomical imaging, X-ray astronomy

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Proceedings Article | 3 November 2004 Paper

Paper

Synchrotron x-ray study of multilayers in Laue geometry

Hyon Chol Kang, Gregory Stephenson, Chian Liu, Ray Conley, Albert Macrander, Jorg Maser, Sasa Bajt, Henry Chapman

Proceedings Volume 5537, (2004) https://doi.org/10.1117/12.560173

KEYWORDS: Multilayers, Zone plates, Diffraction, X-rays, Hard x-rays, X-ray optics, Multiple scattering, Synchrotrons, Scattering, X-ray diffraction

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Proceedings Article | 16 June 2003 Paper

Paper

Lithographic flare measurements of EUV full-field projection optics

Sang Hun Lee, Patrick Naulleau, Christof Krautschik, Manish Chandhok, Henry Chapman, Donna O'Connell, Michael Goldstein

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.485547

KEYWORDS: Mirrors, Extreme ultraviolet, Projection systems, Point spread functions, Lithography, Wavefronts, Spatial frequencies, Extreme ultraviolet lithography, Polishing, Surface roughness

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Proceedings Article | 16 June 2003 Paper

Paper

Lithographic characterization of improved projection optics in the EUVL engineering test stand

Donna O'Connell, Sang Hun Lee, William Ballard, Daniel Tichenor, Louis Bernardez, Steven Haney, Terry Johnson, Pamela Barr, Alvin Leung, Karen Jefferson, William Replogle, John Goldsmith, Henry Chapman, Patrick Naulleau, Stefan Wurm, Eric Panning

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484967

KEYWORDS: Projection systems, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Reticles, Wavefronts

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Proceedings Article | 16 June 2003 Paper

Paper

Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks

Stefan Hau-Riege, Anton Barty, Paul Mirkarimi, Daniel Stearns, Henry Chapman, Donald Sweeney, W. Miles Clift, Eric Gullikson, Moon-Suk Yi

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484729

KEYWORDS: Reflectivity, Photomasks, Extreme ultraviolet lithography, Silicon carbide, Multilayers, Carbon, Silicon, Yield improvement, Ion beams, Critical dimension metrology

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Proceedings Article | 16 June 2003 Paper

Paper

System and process learning in a full-field high-power EUVL alpha tool

William Ballard, Daniel Tichenor, Donna O'Connell, Luis Bernardez, Robert Lafon, Richard Anderson, Alvin Leung, Kenneth Williams, Steven Haney, Yon Perras, Karen Jefferson, Therese Porter, Daniel Knight, Pamela Barr, James Van de Vreugde, Richard Campiotti, Mark Zimmerman, Terry Johnson, Leonard Klebanoff, Philip Grunow, Samuel Graham, Dean Buchenauer, William Replogle, Tony Smith, John Wronosky, Joel Darnold, Kenneth Blaedel, Henry Chapman, John Taylor, Layton Hale, Gary Sommargren, Eric Gullikson, Patrick Naulleau, Kenneth Goldberg, Sang Hun Lee, Harry Shields, Randall St. Pierre, Samuel Ponti

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482791

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Sensors, Extreme ultraviolet lithography, Lithography, Projection systems, Xenon, EUV optics, Fiber optic illuminators

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Proceedings Article | 16 June 2003 Paper

Paper

Design and performance of capping layers for EUV multilayer mirrors

Sasa Bajt, Henry Chapman, Nhan Nguyen, Jennifer Alameda, Jeffrey Robinson, Michael Malinowski, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484966

KEYWORDS: Reflectivity, Multilayers, Electron beams, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Ruthenium, Silicon, Molybdenum, Oxidation

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Proceedings Article | 1 July 2002 Paper

Paper

Honing the accuracy of extreme-ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic

Kenneth Goldberg, Patrick Naulleau, Jeffrey Bokor, Henry Chapman

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472306

KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Interferometers, Interferometry, Extreme ultraviolet lithography, Zernike polynomials, Optical alignment, Mirrors, Optical testing

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Proceedings Article | 1 July 2002 Paper

Paper

Static microfield printing at the advanced light source with the ETS Set-2 optic

Patrick Naulleau, Kenneth Goldberg, Erik Anderson, David Attwood, Phillip Batson, Jeffrey Bokor, Paul Denham, Eric Gullikson, Bruce Harteneck, Brian Hoef, Keith Jackson, Deirdre Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth Blaedel, Henry Chapman, Layton Hale, Regina Soufli, Eberhard Spiller, Donald Sweeney, John Taylor, Christopher Walton, Avijit Ray-Chaudhuri, Donna O'Connell, Richard Stulen, Daniel Tichenor, Charles Gwyn, Pei-yang Yan, Guojing Zhang

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472318

KEYWORDS: Printing, Extreme ultraviolet, Lithography, Fiber optic illuminators, Interferometry, Mirrors, Reticles, Modulation transfer functions, Wavefronts, Critical dimension metrology

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Proceedings Article | 1 July 2002 Paper

Paper

EUVL mask blank repair

Anton Barty, Paul Mirkarimi, Daniel Stearns, Donald Sweeney, Henry Chapman, W. Miles Clift, Scott Hector, Moonsuk Yi

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472313

KEYWORDS: Multilayers, Reflectivity, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Silicon, Ion beams, Molybdenum, Particles, Lithography

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Proceedings Article | 1 July 2002 Paper

Paper

Lithographic evaluation of the EUV engineering test stand

Sang Hun Lee, Daniel Tichenor, William Ballard, Luis Bernardez, John Goldsmith, Steven Haney, Karen Jefferson, Terry Johnson, Alvin Leung, Donna O'Connell, William Replogle, John Wronosky, Kenneth Blaedel, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Henry Chapman, Stefan Wurm, Eric Panning, Pei-yang Yan, Guojing Zhang, John Bjorkholm, Glenn Kubiak, Donald Sweeney, David Attwood, Charles Gwyn

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300

KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution

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Proceedings Article | 1 July 2002 Paper

Paper

Performance upgrades in the EUV engineering test stand

Daniel Tichenor, William Replogle, Sang Hun Lee, William Ballard, Alvin Leung, Glenn Kubiak, Leonard Klebanoff, Samual Graham, John Goldsmith, Karen Jefferson, John Wronosky, Tony Smith, Terry Johnson, Harry Shields, Layton Hale, Henry Chapman, John Taylor, Donald Sweeney, James Folta, Gary Sommargren, Kenneth Goldberg, Patrick Naulleau, David Attwood, Eric Gullikson

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472328

KEYWORDS: Semiconducting wafers, Sensors, Extreme ultraviolet, Reticles, Projection systems, Extreme ultraviolet lithography, Printing, Lithography, Fiber optic illuminators, Wavefronts

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Proceedings Article | 20 December 2001 Paper

Paper

Initial results from the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, Sang Hun Lee, Henry Chapman, William Replogle, Kurt Berger, Richard Stulen, Glenn Kubiak, Leonard Klebanoff, John Wronosky, Donna O'Connell, Alvin Leung, Karen Jefferson, William Ballard, Layton Hale, Kenneth Blaedel, John Taylor, James Folta, Eberhard Spiller, Regina Soufli, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, David Attwood, Uwe Mickan, Ralph Hanzen, Eric Panning, Pei-yang Yan, John Bjorkholm, Charles Gwyn

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450953

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Semiconducting wafers, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Plasma, Sensors, Mirrors

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Proceedings Article | 20 August 2001 Paper

Paper

Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Regina Soufli, Eberhard Spiller, Mark Schmidt, Courtney Davidson, R. Fred Grabner, Eric Gullikson, Benjamin Kaufmann, Stanley Mrowka, Sherry Baker, Henry Chapman, Russell Hudyma, John Taylor, Christopher Walton, Claude Montcalm, James Folta

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436695

KEYWORDS: Multilayers, Mirrors, Reflectivity, Optical coatings, Extreme ultraviolet lithography, Scattering, Extreme ultraviolet, Light scattering, Imaging systems, Cameras

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Proceedings Article | 20 August 2001 Paper

Paper

System integration and performance of the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, William Replogle, Richard Stulen, Glenn Kubiak, Paul Rockett, Leonard Klebanoff, Karen Jefferson, Alvin Leung, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Regina Soufli, Eberhard Spiller, Kenneth Blaedel, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, Phillip Batson, David Attwood, Keith Jackson, Scott Hector, Charles Gwyn, Pei-yang Yan

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436665

KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Reticles, Projection systems, Sensors, Xenon, Mirrors, Optical alignment, Fiber optic illuminators, Multilayers

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Proceedings Article | 21 July 2000 Paper

Paper

EUV engineering test stand

Daniel Tichenor, Glenn Kubiak, William Replogle, Leonard Klebanoff, John Wronosky, Layton Hale, Henry Chapman, John Taylor, James Folta, Claude Montcalm, Russell Hudyma, Kenneth Goldberg, Patrick Naulleau

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390083

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Mirrors, Semiconducting wafers, Distortion, Optical alignment, Fiber optic illuminators, Tolerancing, Optical design

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Proceedings Article | 21 July 2000 Paper

Paper

EUV interferometry of a four-mirror ring-field EUV optical system

Kenneth Goldberg, Patrick Naulleau, Phillip Batson, Paul Denham, Erik Anderson, Jeffrey Bokor, Henry Chapman

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390045

KEYWORDS: Wavefronts, Extreme ultraviolet, Interferometry, Mirrors, Optical testing, Imaging systems, Optical alignment, Interferometers, Charge-coupled devices, Phase shifts

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Proceedings Article | 23 November 1999 Paper

Paper

Novel condenser for EUV lithography ring-field projection optics

Henry Chapman, Keith Nugent

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371121

KEYWORDS: Mirrors, Cameras, Photomasks, Extreme ultraviolet, Projection systems, Reflection, Solids, Collimation, Extreme ultraviolet lithography, Projection lithography

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Proceedings Article | 25 June 1999 Paper

Paper

Sub-100-nm lithographic imaging with an EUV 10X microstepper

John Goldsmith, Kurt Berger, Dan Bozman, Gregory Cardinale, Daniel Folk, Craig Henderson, Donna O'Connell, Avijit Ray-Chaudhuri, Kenneth Stewart, Daniel Tichenor, Henry Chapman, Richard Gaughan, Russell Hudyma, Claude Montcalm, Eberhard Spiller, John Taylor, Jeffrey Williams, Kenneth Goldberg, Eric Gullikson, Patrick Naulleau, Jonathan Cobb

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351097

KEYWORDS: Cameras, Extreme ultraviolet, Imaging systems, Lithography, Extreme ultraviolet lithography, Projection systems, Photoresist developing, Photomasks, Wavefronts, Photoresist materials

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Proceedings Article | 25 June 1999 Paper

Paper

Direct comparison of EUV and visible-light interferometries

Kenneth Goldberg, Patrick Naulleau, Sang Hun Lee, Chang-Hasnain Chang, Cynthia Bresloff, Richard Gaughan, Henry Chapman, John Goldsmith, Jeffrey Bokor

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351138

KEYWORDS: Extreme ultraviolet, Wavefronts, Cameras, Interferometry, Interferometers, Optical coatings, Monochromatic aberrations, Multilayers, Contamination, Lithography

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Proceedings Article | 5 June 1998 Paper

Paper

Rigorous method for compensation selection and alignment of microlithographic optical systems

Henry Chapman, Donald Sweeney

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309562

KEYWORDS: Wavefronts, Extreme ultraviolet, Mirrors, Optical alignment, Distortion, Projection systems, Optical components, Extreme ultraviolet lithography, Optics manufacturing, Tolerancing

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Proceedings Article | 5 June 1998 Paper

Paper

EUV optical design for a 100-nm CD imaging system

Donald Sweeney, Russell Hudyma, Henry Chapman, David Shafer

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309559

KEYWORDS: Distortion, Mirrors, Monochromatic aberrations, Multilayers, Semiconducting wafers, Extreme ultraviolet, Cameras, Photomasks, Optical design, Extreme ultraviolet lithography

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Proceedings Article | 25 September 1995 Paper

Paper

Scanning transmission x-ray microscope at the NSLS: from XANES to cryo

Jorg Maser, Henry Chapman, Chris Jacobsen, Alex Kalinovsky, Janos Kirz, Angelika Osanna, Steve Spector, Steve Wang, Barry Winn, Sue Wirick, Xiaodong Zhang

Proceedings Volume 2516, (1995) https://doi.org/10.1117/12.221685

KEYWORDS: X-rays, Absorption, Zone plates, Microscopes, Helium, Spatial resolution, Sensors, Diodes, Nitrogen, X-ray detectors

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Proceedings Article | 1 February 1994 Paper

Paper

Square capillary x-ray optics

Andrew Peele, Brendan Allman, V. Cucevic, Alberto Cimmino, Keith Nugent, Stephen Wilkins, Henry Chapman

Proceedings Volume 2015, (1994) https://doi.org/10.1117/12.167988

KEYWORDS: X-rays, Capillaries, Reflectivity, Mirrors, Geometrical optics, Surface roughness, Microchannel plates, Photography, X-ray optics, Sensors

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Proceedings Article | 1 February 1994 Paper

Paper

Aberrations of images formed by curved capillary arrays and crystals

Henry Chapman, Andrei Rode

Proceedings Volume 2011, (1994) https://doi.org/10.1117/12.167193

KEYWORDS: Reflectivity, Monochromatic aberrations, Crystals, Interfaces, Mirrors, Spherical lenses, Capillaries, X-rays, Reflection, Geometrical optics

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Proceedings Article | 13 January 1993 Paper

Paper

Capillary x-ray optics

Henry Chapman, Keith Nugent, Stephen Wilkins, Andrei Rode

Proceedings Volume 1741, (1993) https://doi.org/10.1117/12.138758

KEYWORDS: Capillaries, X-rays, Mirrors, Microchannel plates, Reflectivity, Point spread functions, Reflection, Solids, X-ray microscopy, Geometrical optics

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Proceedings Article | 1 July 1990 Paper

Paper

X-ray focusing using capillary arrays

Keith Nugent, Henry Chapman, Stephen Wilkins, Andrew Stevenson, T. Davis

Proceedings Volume 1319, (1990) https://doi.org/10.1117/12.34835

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Showing 5 of 46 publications

Conference Committee Involvement (2)

X-Ray Free-Electron Lasers: Beam Diagnostics, Beamline Instrumentation, and Applications II

18 August 2014 | San Diego, California, United States

X-Ray Free-Electron Lasers: Beam Diagnostics, Beamline Instrumentation, and Applications

14 August 2012 | San Diego, California, United States

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