Mr. Hideaki Abe Profile

Hideaki Abe

Chief Specialist at Toshiba Corp

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Author

Publications (18)

Proceedings Article | 28 March 2017 Presentation + Paper

Required metrology and inspection for nanoimprint lithography

Masafumi Asano, Hideaki Abe, Kazuto Matsuki, Ryoji Yoshikawa, Motofumi Komori, Takashi Hirano, Shinji Mikami, Yongho Kim, Eunhyuk Choi, Woo-Yung Jung

Proceedings Volume 10145, 101450J (2017) https://doi.org/10.1117/12.2258369

KEYWORDS: Inspection, Nanoimprint lithography, Metrology, Lithography, Process control, Scatterometry, Semiconducting wafers, Optical inspection, Scanning electron microscopy, Optical lithography

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Proceedings Article | 8 March 2016 Paper

Scatterometry-based process control for nanoimprint lithography

Masafumi Asano, Hirotaka Tsuda, Motofumi Komori, Kazuto Matsuki, Hideaki Abe, Woo-Yung Jung

Proceedings Volume 9778, 977820 (2016) https://doi.org/10.1117/12.2218994

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Process control, Scatterometry, Etching, Manufacturing, Photoresist processing, Metrology, Image processing, Lithography, Semiconducting wafers, Optical lithography, Control systems, Photomasks

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SPIE Journal Paper | 2 October 2014 Open Access

Verification metrology system by using inline reference metrology

Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Akira Hamaguchi, Takahiro Ikeda, Yuichiro Yamazaki

JM3, Vol. 13, Issue 04, 041405, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041405

KEYWORDS: Metrology, Scatterometry, X-rays, Nondestructive evaluation, Scattering, Scanning electron microscopy, Semiconducting wafers, Etching, Scatter measurement, Silicon

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Proceedings Article | 2 April 2014 Paper

The measurement uncertainty of CD measurement in the optical measurement technology using Fourier image

Kuniharu Nagashima, Hideaki Abe, Makoto Oote, Yuichiro Yamazaki

Proceedings Volume 9050, 905034 (2014) https://doi.org/10.1117/12.2048759

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Calibration, Optical testing, Image processing, Metrology, Scatterometry, Image analysis, Data processing, Polarizers

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Proceedings Article | 2 April 2014 Paper

Verification metrology system by using inline reference metrology

Hideaki Abe, Yasuhiko Ishibashi, Chihiro Ida, Akira Hamaguchi, Takahiro Ikeda, Yuichiro Yamazaki

Proceedings Volume 9050, 90501L (2014) https://doi.org/10.1117/12.2048686

KEYWORDS: Metrology, Scatterometry, Nondestructive evaluation, Inspection, Semiconducting wafers, Scattering, Silicon, X-rays, Scatter measurement, Signal detection

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Proceedings Article | 5 April 2012 Paper

Novel prediction methodology for etched hole patterning failure

Seiro Miyoshi, Hideaki Abe, Kazuhiro Takahata, Tomoko Ojima, Masanari Kajiwara, Shoji Mimotogi, Kohji Hashimoto

Proceedings Volume 8324, 83241J (2012) https://doi.org/10.1117/12.916029

KEYWORDS: Optical lithography, Critical dimension metrology, Failure analysis, Lithography, Finite element methods, Process control, Photoresist processing, Reactive ion etching, Data modeling, Optimization (mathematics)

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Proceedings Article | 24 March 2009 Paper

Use of 3D metrology for process control

Bart Rijpers, Jo Finders, Hidekazu Suzuki, Toshiaki Fujii, Yuichiro Yamazaki, Hideaki Abe, Fabián Pérez-Willard

Proceedings Volume 7272, 727235 (2009) https://doi.org/10.1117/12.816370

KEYWORDS: 3D metrology, Transmission electron microscopy, Argon, Photoresist materials, Fourier transforms, Scatterometry, Scanning transmission electron microscopy, Semiconducting wafers, Coating, Scanning electron microscopy

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Proceedings Article | 24 March 2009 Paper

Investigation of factors causing difference between simulation and real SEM image

M. Kadowaki, A. Hamaguchi, H. Abe, Y. Yamazaki, S. Borisov, A. Ivanchikov, S. Babin

Proceedings Volume 7272, 72723I (2009) https://doi.org/10.1117/12.814036

KEYWORDS: Oxides, Scanning electron microscopy, Monte Carlo methods, Silicon, Silica, Wet etching, Inspection, Optical spheres, Electron beams, Data acquisition

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Proceedings Article | 24 March 2009 Paper

Time dependence of SEM signal due to charging: measurements and simulation using Monte Carlo software

H. Abe, S. Babin, S. Borisov, A. Hamaguchi, A. Ivanchikov, M. Kadowaki, Y. Yamazaki

Proceedings Volume 7272, 727248 (2009) https://doi.org/10.1117/12.816899

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Silica, Silicon, Electron beams, Dielectrics, Defect inspection, Optical simulations, Sensors, 3D modeling

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Proceedings Article | 24 March 2009 Paper

Hotspot monitoring system with contour-based metrology

A. Kawamoto, Y. Tanaka, S. Tsuda, K. Shibayama, S. Furukawa, H. Abe, T. Mitsui, Y. Yamazaki

Proceedings Volume 7272, 72721F (2009) https://doi.org/10.1117/12.814022

KEYWORDS: Inspection, Metrology, Lithography, Critical dimension metrology, Manufacturing, Visualization, Image acquisition, Semiconducting wafers, Process control, Image processing

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Proceedings Article | 23 March 2009 Paper

CD-SEM tool stability and tool-to-tool matching management using image sharpness monitor

Hideaki Abe, Yasuhiko Ishibashi, Yuichiro Yamazaki, Akemi Kono, Tatsuya Maeda, Akihiro Miura, Shunsuke Koshihara, Daisuke Hibino

Proceedings Volume 7272, 727210 (2009) https://doi.org/10.1117/12.813993

KEYWORDS: Critical dimension metrology, Monochromatic aberrations, Metrology, Scanning electron microscopy, Contamination, Visualization, Image resolution, Convolution, Electron beams, Image processing

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Proceedings Article | 24 March 2008 Paper

Experiment and simulation of charging effects in SEM

S. Babin, S. Borisov, Y. Miyano, H. Abe, M. Kadowaki, A. Hamaguchi, Y. Yamazaki

Proceedings Volume 6922, 692219 (2008) https://doi.org/10.1117/12.772255

KEYWORDS: Monte Carlo methods, Silica, Scanning electron microscopy, Silicon, Optical simulations, Scattering, Electron beams, Laser scattering, Sensors, Electron transport

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Proceedings Article | 5 April 2007 Paper

Evaluation of CD-SEM measurement uncertainty using secondary electron simulation with charging effect

Hideaki Abe, Akira Hamaguchi, Yuichiro Yamazaki

Proceedings Volume 6518, 65180L (2007) https://doi.org/10.1117/12.712191

KEYWORDS: Critical dimension metrology, Optical simulations, Electron beams, Monte Carlo methods, Silicon, Scanning electron microscopy, Scattering, Laser scattering, Oxides, Atomic force microscopy

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SPIE Journal Paper | 1 October 2006

Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology

Masafumi Asano, Takahiro Ikeda, Toru Koike, Hideaki Abe

JM3, Vol. 5, Issue 04, 043006, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397034

KEYWORDS: Scanning electron microscopy, Scatterometry, Metrology, Critical dimension metrology, Monte Carlo methods, Inspection, Stereolithography, Manufacturing, Time metrology, Optical proximity correction

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Proceedings Article | 24 March 2006 Paper

Error factor in bottom CD measurement for contact hole using CD-SEM

Hideaki Abe, Yuichiro Yamazaki

Proceedings Volume 6152, 61524H (2006) https://doi.org/10.1117/12.659555

KEYWORDS: Critical dimension metrology, Silicon, Scanning electron microscopy, Image processing, Transmission electron microscopy, Electron beams, Time metrology, Semiconducting wafers, Image quality, Edge detection

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Proceedings Article | 24 March 2006 Paper

Inline CD metrology with combined use of scatterometry and CD-SEM

Masafumi Asano, Takahiro Ikeda, Toru Koike, Hideaki Abe

Proceedings Volume 6152, 61521V (2006) https://doi.org/10.1117/12.656326

KEYWORDS: Scatterometry, Critical dimension metrology, Metrology, Scanning electron microscopy, Monte Carlo methods, Inspection, Time metrology, Statistical analysis, Optics manufacturing, Line edge roughness

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Proceedings Article | 10 May 2005 Paper

Sampling plan optimization for CD control in low k1 lithography

Masafumi Asano, Toru Koike, Toru Mikami, Hideaki Abe, Takahiro Ikeda, Satoshi Tanaka, Shoji Mimotogi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600370

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Error analysis, Lithography, Neptunium, Metrology, Statistical analysis, Manufacturing, Reticles, Process control

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Proceedings Article | 24 May 2004 Paper

Measurement precision of CD-SEM for 65-nm technology node

Hideaki Abe, Hiroshi Motoki, Takahiro Ikeda, Yuichiro Yamazaki

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534910

KEYWORDS: Critical dimension metrology, Factor analysis, Semiconducting wafers, Pattern recognition, Error analysis, Image quality, Scanning electron microscopy, Quality measurement, Semiconductors, Neodymium

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Showing 5 of 18 publications

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