Hideaki Hashimoto
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 28 June 2013 Paper
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Inspection, Image sensors, Image transmission, Photomasks, Extreme ultraviolet, Double patterning technology

Proceedings Article | 30 June 2012 Paper
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Laser sources, Lithography, Laser development, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts, Current controlled current source

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Light sources, Lithographic illumination, Defect detection, Inspection, Image sensors, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Image contrast enhancement

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Defect detection, Inspection, Image sensors, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Image contrast enhancement, Signal detection

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Laser sources, Super resolution, Defect detection, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Image contrast enhancement, Optical alignment, EUV optics

Showing 5 of 10 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top