Mr. Hideaki Takano Profile

Hideaki Takano

at Tokyo Seimitsu Co Ltd

SPIE Involvement:

Author

Publications (3)

SPIE Journal Paper | 1 April 2005

Low energy electron beam proximity projection lithography

Norihiko Samoto, Akira Yoshida, Hideaki Takano, Akihiro Endo, Toyoji Fukui

JM3, Vol. 4, Issue 02, 023008, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898063

KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Electron beams, Optical alignment, Distortion, Electron beam lithography, Wafer-level optics, Projection lithography, Scanners

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Proceedings Article | 20 May 2004 Paper

LEEPL (low-energy electron beam proximity-projection lithography) over-lay status

Norifumi Nakajima, Takuji Atarashi, Hiroyuki Sakai, Toyoji Fukui, Hideaki Takano, Daizo Amano

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536229

KEYWORDS: Photomasks, Distortion, Semiconducting wafers, Charged-particle lithography, Optical alignment, Electron beam lithography, Electron beams, Microscopes, CCD image sensors, Lithography

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Proceedings Article | 20 May 2004 Paper

LEEPL production tool: EBPrinter LEEPL-3000

Norihiko Samoto, Hideaki Takano, Akihiro Endo, Akira Yoshida, Toyoji Fukui

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535109

KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Optical alignment, Electron beams, Lithography, Scanners, Data corrections, Electron beam lithography, Distortion

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