Hidehiro Watanabe
at EUVL Infrastructure Development Ctr Inc
SPIE Involvement:
Author
Publications (63)

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Multilayers, Image processing, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 24 June 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Defect detection, Inspection, Photomasks, Signal detection, Extreme ultraviolet lithography, Detection and tracking algorithms, Image processing, Optimization (mathematics), Extreme ultraviolet, Electron microscopes

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Imaging systems, Sensors, Image processing, Inspection, Electron microscopes, Image sensors, Photomasks, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Oxides, Multilayers, Metrology, Contamination, Defect detection, Metals, Crystals, Inspection, Monte Carlo methods, Image quality, Photomasks, Extreme ultraviolet, Selenium, Ruthenium

SPIE Journal Paper | 22 March 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Inspection, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Line edge roughness, Image processing, Image resolution, Ultraviolet detectors, Photomasks, Electron microscopes

Showing 5 of 63 publications
Proceedings Volume Editor (2)

Conference Committee Involvement (7)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Showing 5 of 7 Conference Committees
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