Dr. Hideki Ina Profile

Dr. Hideki Ina

at Canon Inc

SPIE Involvement:

Conference Program Committee | Author

Publications (17)

Proceedings Article | 4 April 2011 Paper

Scatterometry sensitivity for NIL process

Takahiro Miyakawa, Kazuhiro Sato, Koichi Sentoku, Hideki Ina

Proceedings Volume 7970, 79701N (2011) https://doi.org/10.1117/12.880910

KEYWORDS: Scatterometry, Nanoimprint lithography, Reflectivity, Photoresist processing, Polarization, Immersion lithography, Critical dimension metrology, Silicon, Remote sensing, Lithography

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Proceedings Article | 3 April 2010 Paper

A first order analysis of scatterometry sensitivity for NIL process

Takahiro Miyakawa, Koichi Sentoku, Kazuhiro Sato, Hideki Ina

Proceedings Volume 7637, 763721 (2010) https://doi.org/10.1117/12.855872

KEYWORDS: Scatterometry, Nanoimprint lithography, Polarization, Photoresist processing, Reflectivity, Remote sensing, Critical dimension metrology, Received signal strength, Cadmium, Lithography

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Proceedings Article | 24 March 2009 Paper

Focus and dose control for high-volume manufacturing of semiconductor

Koichi Sentoku, Takeaki Ebihara, Hideki Ina

Proceedings Volume 7272, 727238 (2009) https://doi.org/10.1117/12.811776

KEYWORDS: Semiconducting wafers, Finite element methods, Semiconductors, Data modeling, Control systems, Critical dimension metrology, Semiconductor manufacturing, High volume manufacturing, Wafer testing, Inspection

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Proceedings Article | 4 December 2008 Paper

Focus and dose control for high volume manufacturing

Hideki Ina, Koichi Sentoku

Proceedings Volume 7140, 71400Q (2008) https://doi.org/10.1117/12.805314

KEYWORDS: Semiconducting wafers, Manufacturing, Finite element methods, Data modeling, Semiconductors, Control systems, Semiconductor manufacturing, Critical dimension metrology, Optics manufacturing, Optical testing

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Proceedings Article | 25 March 2008 Paper

Scatterometry based overlay metrology

Takahiro Matsumoto, Hideki Ina, Koichi Sentoku, Satoru Oishi

Proceedings Volume 6922, 69223L (2008) https://doi.org/10.1117/12.768906

KEYWORDS: Overlay metrology, Scatterometry, Optical alignment, Lithography, Inspection, Semiconductors, Silicon, Semiconducting wafers, Distortion, Metrology

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Proceedings Article | 22 March 2008 Paper

Focus and dose control to actual process wafer

Hideki Ina, Koichi Sentoku

Proceedings Volume 6922, 692212 (2008) https://doi.org/10.1117/12.768893

KEYWORDS: Semiconducting wafers, Data modeling, Finite element methods, Semiconductors, Process control, Wafer testing, Critical dimension metrology, Optical testing, Inspection, Inverse problems

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Proceedings Article | 4 April 2007 Paper

Focus and dose controls, and their application in lithography

Hideki Ina, Koichi Sentoku, Satoru Oishi, Tomoyuki Miyashita, Takahiro Matsumoto

Proceedings Volume 6518, 651807 (2007) https://doi.org/10.1117/12.710456

KEYWORDS: Semiconducting wafers, Control systems, Finite element methods, Semiconductors, Data modeling, Critical dimension metrology, Lithography, Wafer testing, Signal processing, Inverse problems

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Proceedings Article | 15 March 2007 Paper

Critical issues study of nano-imprint tool for semiconductor volume production

Hideki Ina, Kazuyuki Kasumi, Eigo Kawakami, Kouji Uda

Proceedings Volume 6517, 65170M (2007) https://doi.org/10.1117/12.710443

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Double patterning technology, Semiconductors, Photomasks, Extreme ultraviolet, Overlay metrology, Ultraviolet radiation

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Proceedings Article | 17 May 2005 Paper

The first intrinsic process monitoring system for 90-nm device with focus and dose line navigator (FDLN)

Takeshi Kato, S. Nagatsuka, T. Tashiro, T. Kawachi, Hideki Ina, Koichi Sentoku

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.604489

KEYWORDS: Semiconducting wafers, Finite element methods, Critical dimension metrology, Control systems, Optical proximity correction, Navigation systems, Scanners, Etching, Process control, Optical lithography

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Proceedings Article | 17 May 2005 Paper

Log data extraction and correlation miner for lithography management system: LMS-LEC

Eiichi Kawamura, Hidetaka Tsuda, Hidehiro Shirai, Satoru Oishi, Hideki Ina

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.594994

KEYWORDS: Inspection, Lithography, Control systems, Statistical analysis, Mining, Data analysis, Manufacturing, Process control, Data mining, Semiconductors

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Proceedings Article | 10 May 2005 Paper

Focus and dose measurement method in volume production

Hideki Ina, Satoru Oishi, Koichi Sentoku

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.593058

KEYWORDS: Semiconducting wafers, Finite element methods, Data modeling, Semiconductors, Optical testing, Neural networks, Critical dimension metrology, Wafer-level optics, Wafer testing, Lithography

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Proceedings Article | 24 May 2004 Paper

Alignment offset analyzer against wafer-induced shift (WIS)

Takahiro Matsumoto, Hideki Ina, Koichi Sentoku

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534757

KEYWORDS: Optical alignment, Semiconducting wafers, Photoresist materials, Error analysis, Coating, Semiconductors, Analytical research, Lithography, Near field optics, Signal processing

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Proceedings Article | 2 June 2003 Paper

New criterion about the topography of W-CMP wafer's alignment mark

Hideki Ina, Takahiro Matsumoto, Koichi Sentoku, Katsuhiro Matsuyama, Kazuhiko Katagiri

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.504579

KEYWORDS: Semiconducting wafers, Optical alignment, Chemical mechanical planarization, Tungsten, Atomic force microscope, Atomic force microscopy, Photoresist processing, Semiconductors, Overlay metrology, Data centers

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Proceedings Article | 30 July 2002 Paper

Novel strategy for wafer-induced shift (WIS)

Koichi Sentoku, Takahiro Matsumoto, Hideki Ina

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474477

KEYWORDS: Optical alignment, Semiconducting wafers, Chemical analysis, Chemical mechanical planarization, Tungsten, Signal processing, Error analysis, Overlay metrology, Semiconductors, Near field optics

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Proceedings Article | 16 July 2002 Paper

TIS-WIS interaction characterization on overlay measurement tool

Kenji Hoshi, Eiichi Kawamura, Hiroshi Morohoshi, Hideki Ina, Takanori Fujimura, Hiroyuki Kurita, Joel Seligson

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473514

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Monochromatic aberrations, Chemical mechanical planarization, Optical alignment, Wafer-level optics, Tungsten, Metals, Silicon

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