Hideki Matsui
Manager at NuFlare Technology.inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 25 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Electron beams, Optical lithography, Magnetism, Data processing, Objectives, Distributed computing, Photomasks, Double patterning technology, Overlay metrology

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