Mr. Hidemitsu Hakii Profile

Hidemitsu Hakii

at Toppan Printing Co Ltd

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Author

Publications (9)

Proceedings Article | 28 June 2013 Paper

A study of phase defect measurement on EUV mask by multiple detectors CD-SEM

Isao Yonekura, Hidemitsu Hakii, Shinya Morisaki, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 8701, 870110 (2013) https://doi.org/10.1117/12.2031846

KEYWORDS: 3D metrology, Sensors, 3D image processing, Atomic force microscopy, 3D vision, 3D acquisition, Extreme ultraviolet, Scanning electron microscopy, Phase measurement, Electron beams

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Proceedings Article | 30 June 2012 Paper

Evaluation of 3D metrology potential using a multiple detector CDSEM

Hidemitsu Hakii, Isao Yonekura, Yasushi Nishiyama, Keishi Tanaka, Kenji Komoto, Tsutomu Murakawa, Mitsuo Hiroyama, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 8441, 844113 (2012) https://doi.org/10.1117/12.977362

KEYWORDS: Sensors, Scanning electron microscopy, 3D metrology, Photomasks, Image segmentation, Signal detection, Atomic force microscopy, 3D image processing, Detection and tracking algorithms, Metrology

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Proceedings Article | 30 June 2012 Paper

CD-Metrology of EUV masks in the presence of charging: measurement and simulation

Sergey Babin, Sergey Borisov, Hidemitsu Hakii, Yasushi Nishiyama, Isao Yonekura

Proceedings Volume 8441, 844108 (2012) https://doi.org/10.1117/12.999462

KEYWORDS: Monte Carlo methods, Extreme ultraviolet, Scanning electron microscopy, Photomasks, Sensors, Metrology, Oxides, Signal detection, Multilayers, Electron beams

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Proceedings Article | 14 October 2011 Paper

Addressing 3D metrology challenges by using a multiple detector CDSEM

Mitsuo Hiroyama, Tsutomu Murakawa, Masayuki Kuribara, Toshimichi Iwai, Minoru Soma, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Kenji Komoto

Proceedings Volume 8166, 81661R (2011) https://doi.org/10.1117/12.896982

KEYWORDS: Sensors, Signal detection, 3D metrology, Photomasks, Atomic force microscopy, Lithography, Scanning electron microscopy, Image sensors, Edge detection, Extreme ultraviolet

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Proceedings Article | 19 May 2011 Paper

New CD-SEM metrology method for the side wall angle measurement using multiple detectors

Hiroshi Fukaya, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 8081, 80810G (2011) https://doi.org/10.1117/12.899368

KEYWORDS: Sensors, Signal detection, Photomasks, Algorithm development, 3D metrology, Polonium, Metrology, Scanning electron microscopy, Electron beams, Detection and tracking algorithms

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Proceedings Article | 20 April 2011 Paper

Influence of the charging effect on the precision of measuring EUV mask features

Yasushi Nishiyama, Hidemitsu Hakii, Isao Yonekura, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 7971, 79710C (2011) https://doi.org/10.1117/12.878728

KEYWORDS: Electrons, Extreme ultraviolet, Silica, Monte Carlo methods, Photomasks, Tantalum, Scanning electron microscopy, Critical dimension metrology, Multilayers, Scattering

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Proceedings Article | 20 April 2011 Paper

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM

Isao Yonekura, Hidemitsu Hakii, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7971, 797121 (2011) https://doi.org/10.1117/12.879400

KEYWORDS: Sensors, Atomic force microscopy, Signal detection, Photomasks, Etching, 3D metrology, Tantalum, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet

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Proceedings Article | 23 September 2009 Paper

A study of contour image comparison measurement for photomask patterns of 32 nm and beyond

Isao Yonekura, Hidemitsu Hakii, Keishi Tanaka, Masaru Higuchi, Yoshiaki Ogiso, Toshihide Oba, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7488, 748831 (2009) https://doi.org/10.1117/12.833405

KEYWORDS: Photomasks, Distance measurement, Scanning electron microscopy, Cadmium, Critical dimension metrology, Image enhancement, Printing, Semiconducting wafers, Reticles, Software development

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Proceedings Article | 11 May 2009 Paper

An evaluation of a new side-wall-angle measurement technique for mask patterns by CD-SEM

Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yosuke Kojima, Yoshifumi Sakamoto, Keishi Tanaka

Proceedings Volume 7379, 737922 (2009) https://doi.org/10.1117/12.824280

KEYWORDS: Photomasks, Extreme ultraviolet, Scanning electron microscopy, Metrology, Pixel resolution, Time metrology, 3D metrology, Scatterometry, Electron beams, Reflectivity

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Showing 5 of 9 publications

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