Dr. Hideo Namatsu Profile

Dr. Hideo Namatsu

Senior Research Engineer at Univ of Tokyo

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Author

Publications (9)

Proceedings Article | 4 May 2005 Paper

Impregnation of resist with functional molecules using supercritical fluid: a new approach to resist engineering for advanced lithography

Hideo Namatsu, Mitsuru Sato

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.597709

KEYWORDS: Molecules, Etching, Lithography, Ultraviolet radiation, Absorbance, Photoresist processing, Optical lithography, Infrared spectroscopy, Photoemission spectroscopy, Nitrogen

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Proceedings Article | 14 May 2004 Paper

Rapid supercritical drying techniques for advanced lithography

Hideo Namatsu

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533981

KEYWORDS: Liquids, Lithography, Helium, Semiconducting wafers, Polymers, Photoresist processing, Water, Carbon monoxide, Chemical species, Gases

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Proceedings Article | 12 June 2003 Paper

Molecular weight effect on line-edge roughness

Toru Yamaguchi, Kenji Yamazaki, Hideo Namatsu

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485049

KEYWORDS: Line edge roughness, Polymers, Polymer thin films, Surface roughness, Molecular aggregates, Atomic force microscopy, Lithography, Scanning electron microscopy, Molecules, Electron beams

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Proceedings Article | 24 July 2002 Paper

Generation mechanism of surface roughness in resists: free volume effect on surface roughness

Toru Yamaguchi, Hideo Namatsu

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474165

KEYWORDS: Surface roughness, Molecular aggregates, Polymers, Molecules, Line edge roughness, Atomic force microscopy, Atomic force microscope, Photoresist processing, Polymer thin films, Image processing

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Proceedings Article | 1 July 2002 Paper

New supercritical resist dryer

Hideo Namatsu

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472267

KEYWORDS: Carbon dioxide, Semiconducting wafers, Liquids, Silicon, Convection, Nitrogen, Capillaries, High aspect ratio silicon micromachining, Interfaces, Scanning electron microscopy

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Proceedings Article | 21 July 2000 Paper

Sub-10-nm electron-beam lithography with sub-10-nm overlay accuracy

Kenji Yamazaki, Mohammad Saifullah, Hideo Namatsu, Kenji Kurihara

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390084

KEYWORDS: Lithography, Etching, Nanostructures, Nanolithography, Overlay metrology, Silicon, Photoresist processing, Nanofabrication, Magnetism, Monochromatic aberrations

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Proceedings Article | 11 June 1999 Paper

Line-edge roughness characterized by polymer aggregates in photoresists

Toru Yamaguchi, Hideo Namatsu, Masao Nagase, Kenji Kurihara, Yoshio Kawai

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350246

KEYWORDS: Polymers, Line edge roughness, Polymer thin films, Surface roughness, Atomic force microscopy, Photoresist materials, Photoresist developing, Lithography, Deep ultraviolet, Atomic force microscope

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Proceedings Article | 11 June 1999 Paper

Spin-coatable Al2O3 resists in electron-beam nanolithography

Mohammad Saifullah, Hideo Namatsu, Toru Yamaguchi, Kenji Yamazaki, Kenji Kurihara

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350248

KEYWORDS: Electron beams, Absorption, FT-IR spectroscopy, Nanolithography, Aluminum, Metals, Silicon, Scanning electron microscopy, Silicon films, Humidity

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Proceedings Article | 29 June 1998 Paper

New development model: aggregate extraction development

Toru Yamaguchi, Hideo Namatsu, Masao Nagase, Kenji Yamazaki, Kenji Kurihara

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312432

KEYWORDS: Polymers, Polymer thin films, Molecules, Molecular aggregates, Atomic force microscopy, Scanning electron microscopy, Electron beams, Diffusion, Lithography, Photoresist processing

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Showing 5 of 9 publications

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