Mr. Hideo Shite Profile

Hideo Shite

at Tokyo Electron Kyushu Ltd

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 19 March 2018 Paper

Resist coating and developing process technology toward EUV manufacturing sub-7nm node

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Yusaku Hashimoto, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Marc Demand, Philippe Foubert

Proceedings Volume 10583, 105831V (2018) https://doi.org/10.1117/12.2297203

KEYWORDS: Semiconducting wafers, Particles, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photoresist processing, System on a chip, Coating, Yield improvement

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Proceedings Article | 27 March 2017 Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Masashi Enomoto, Kathleen Nafus, Marc Demand, Philippe Foubert

Proceedings Volume 10143, 1014326 (2017) https://doi.org/10.1117/12.2257931

KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Coating, High volume manufacturing, Semiconducting wafers, Neodymium, Particles, System on a chip, Silicon

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Proceedings Article | 1 April 2013 Paper

Track processing optimizations for different EUV resist platforms: preparing for a NXE:3300 baseline process

Philippe Foubert, Koichi Matsunaga, Hideo Shite, Takeshi Shimoaoki, Kathleen Nafus, Anne-Marie Goethals, Dieter Van Den Heuvel, Jan Hermans, Eric Hendrickx, Hitoshi Kosugi

Proceedings Volume 8679, 86792T (2013) https://doi.org/10.1117/12.2011514

KEYWORDS: Photoresist processing, Semiconducting wafers, Extreme ultraviolet, Line width roughness, Standards development, Extreme ultraviolet lithography, Coating, Inspection, Image processing, Plasma

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Proceedings Article | 23 March 2012 Paper

Latest cluster performance for EUV lithography

H. Shite, K. Matsunaga, K. Nafus, H. Kosugi, P. Foubert, J. Hermans, E. Hendrickx, M. Goethals, D. Van Den Heuvel

Proceedings Volume 8322, 83222Y (2012) https://doi.org/10.1117/12.916388

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line width roughness, Photoresist processing, Image processing, Scanners, Manufacturing, Particles

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Proceedings Article | 8 April 2011 Paper

EUV processing investigation on state of the art coater/developer system

H. Shite, N. Bradon, T. Shimoaoki, S. Kobayashi, K. Nafus, H. Kosugi, P. Foubert, J. Hermans, E. Hendrickx, M. Goethals, R. Gronheid, C. Jehoul

Proceedings Volume 7969, 796937 (2011) https://doi.org/10.1117/12.879406

KEYWORDS: Photoresist processing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Standards development, Manufacturing, Particles, Critical dimension metrology

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Proceedings Article | 7 April 2011 Paper

Understanding EUV resist dissolution characteristics and its impact to RLS limitations

Carlos Fonseca, Brian Head, Hideo Shite, Kathleen Nafus, Roel Gronheid, Gustaf Winroth

Proceedings Volume 7969, 796911 (2011) https://doi.org/10.1117/12.879449

KEYWORDS: Extreme ultraviolet, Lithography, Photoresist processing, Data modeling, Calibration, Polymers, Semiconducting wafers, Extreme ultraviolet lithography, Autoregressive models, Data mining

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SPIE Journal Paper | 1 January 2011

Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist

Roel Gronheid, Alessandro Vaglio Pret, Benjamen Rathsack, Joshua Hooge, Steven Scheer, Kathleen Nafus, Hideo Shite, Junichi Kitano

JM3, Vol. 10, Issue 1, 013017, (January 2011) https://doi.org/10.1117/12.10.1117/1.3555090

KEYWORDS: Extreme ultraviolet, Diffusion, Polymers, Data modeling, Line width roughness, Extreme ultraviolet lithography, Quantum efficiency, Absorbance, Silicon, Contamination

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Proceedings Article | 30 March 2010 Paper

LWR reduction by novel lithographic and etch techniques

Shinji Kobayashi, Satoru Shimura, Tetsu Kawasaki, Kathleen Nafus, Shinichi Hatakeyama, Hideo Shite, Eiichi Nishimura, Masato Kushibiki, Arisa Hara, Roel Gronheid, Alessandro Vaglio-Pret, Junichi Kitano

Proceedings Volume 7639, 763914 (2010) https://doi.org/10.1117/12.846318

KEYWORDS: Line width roughness, Photoresist processing, Etching, Image processing, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Image analysis, Coating, Critical dimension metrology

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Proceedings Article | 26 March 2010 Paper

EUV RLS performance tradeoffs for a polymer bound PAG resist

Roel Gronheid, Alessandro Vaglio Pret, Benjamen Rathsack, Joshua Hooge, Steven Scheer, Kathleen Nafus, Hideo Shite, Junichi Kitano

Proceedings Volume 7639, 76390M (2010) https://doi.org/10.1117/12.847489

KEYWORDS: Extreme ultraviolet, Polymers, Diffusion, Line width roughness, Data modeling, Quantum efficiency, Silicon, Absorbance, Interfaces, Contamination

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Proceedings Article | 23 March 2010 Paper

Further investigation of EUV process sensitivities for wafer track processing

Neil Bradon, K. Nafus, H. Shite, J. Kitano, H. Kosugi, M. Goethals, S. Cheng, J. Hermans, E. Hendrickx, B. Baudemprez, D. Van Den Heuvel

Proceedings Volume 7636, 763630 (2010) https://doi.org/10.1117/12.846610

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Photomasks, Photoresist processing, Manufacturing, Wafer testing, Lithography, Reticles

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Proceedings Article | 1 April 2009 Paper

Improvements in process performance for immersion technology high volume manufacturing

K. Nafus, T. Shimoaoki, M. Enomoto, H. Shite, T. Otsuka, H. Kosugi, T. Shibata, J. Mallmann, R. Maas, C. Verspaget, E. van der Heijden, E. van Setten, J. Finders, S. Wang, N. Boudou, C. Zoldesi

Proceedings Volume 7273, 727338 (2009) https://doi.org/10.1117/12.813485

KEYWORDS: Semiconducting wafers, Particles, Scanners, Critical dimension metrology, Photomicroscopy, Photoresist processing, Contamination, Etching, Polymers, Bridges

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Proceedings Article | 1 April 2009 Paper

CDU improvement with wafer warpage control oven for high-volume manufacturing

T. Tomita, H. Weichert, S. Hornig, S. Trepte, H. Shite, R. Uemura, J. Kitano

Proceedings Volume 7273, 72734C (2009) https://doi.org/10.1117/12.814174

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Control systems, Immersion lithography, Manufacturing, High volume manufacturing, Process control, Polymers, Lithography

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Proceedings Article | 14 May 2004 Paper

Critical dimension control in 90nm - 65nm node

Yuichi Terashita, Mamoko Shizukuishi, Hideo Shite, Hideharu Kyoda, Kazuhiko Oshima, Kosuke Yoshihara

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534997

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photoresist materials, Photoresist developing, Temperature metrology, Diffusion, Photomasks, Semiconductor manufacturing, Manufacturing, Optical lithography

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Showing 5 of 13 publications

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