Mr. Hideo Tsuchiya Profile

Hideo Tsuchiya

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 23 October 2015 Paper

DUV inspection tool application for beyond optical resolution limit pattern

Hiromu Inoue, Nobutaka Kikuiri, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Takashi Hirano, Ryoji Yoshikawa

Proc. SPIE. 9635, Photomask Technology 2015

KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Optical resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography

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Proceedings Article | 28 June 2013 Paper

Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly

Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara

Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX

KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Inspection, Image sensors, Image transmission, Photomasks, Extreme ultraviolet, Double patterning technology

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Proceedings Article | 19 May 2011 Paper

Practical mask inspection system with printability and pattern priority verification

Hideo Tsuchiya, Fumio Ozaki, Kenichi Takahara, Takafumi Inoue, Nobutaka Kikuiri

Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII

KEYWORDS: Electronics, Defect detection, Image processing, Inspection, Computing systems, Computer simulations, Photomasks, Source mask optimization, Computational lithography, Semiconducting wafers

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Proceedings Article | 25 May 2010 Paper

Mask inspection system with variable sensitivity and printability verification function

Takafumi Inoue, Kenichi Takahara, Hideo Tsuchiya, Masakazu Tokita, Tadao Inoue, Masaki Yamabe

Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII

KEYWORDS: Defect detection, Databases, Inspection, Image sensors, Image transmission, Photomasks, Source mask optimization, Data conversion, Semiconducting wafers

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Proceedings Article | 16 April 2010 Paper

Mask data rank and printability verification function of mask inspection system

Kenichi Takahara, Masakazu Tokita, Hideo Tsuchiya, Masaki Yamabe, Nobutaka Kikuiri, Kinya Usuda

Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV

KEYWORDS: Semiconductors, Defect detection, Databases, Inspection, Computer simulations, Photomasks, Source mask optimization, Optical proximity correction, Data conversion, Defect inspection

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Proceedings Article | 23 September 2009 Paper

Defect printability analysis by lithographic simulation from high resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Yasuko Saito, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Wafer-level optics, Lithography, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Printing, Photomasks, Semiconducting wafers

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Proceedings Article | 23 September 2009 Paper

Printability verification function of mask inspection system

Hideo Tsuchiya, Masaki Yamabe, Masakazu Tokita, Kenichi Takahara, Kinya Usuda, Fumio Ozaki, Nobutaka Kikuiri

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Optical inspection, Telecommunications, Image transmission, Photomasks, SRAF, Semiconducting wafers

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Proceedings Article | 11 May 2009 Paper

Mask-LMC: lithographic simulation and defect detection from high-resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Wafer-level optics, Lithography, Defect detection, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Photomasks, Semiconducting wafers

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Proceedings Article | 11 May 2009 Paper

A study of mask inspection method with pattern priority and printability check

Masakazu Tokita, Hideo Tsuchiya, Takafumi Inoue, Tadao Inoue, Masaki Yamabe

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Defect detection, Image processing, Interfaces, Inspection, Image sensors, Data processing, Photomasks, Analytical research, Semiconducting wafers, Defect inspection

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Proceedings Article | 17 October 2008 Paper

Flexible sensitivity inspection with TK-CMI software for criticality-awareness

Frank Driessen, Jamila Gunawerdana, Yakuko Saito, Hideo Tsuchiya, Yoshitake Tsuji

Proc. SPIE. 7122, Photomask Technology 2008

KEYWORDS: Defect detection, Databases, Manufacturing, Inspection, Data processing, Photomasks, Optical proximity correction, Mask making, Data conversion, Defect inspection

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Proceedings Article | 19 May 2008 Paper

Die-to-database mask inspection with variable sensitivity

Hideo Tsuchiya, Masakazu Tokita, Takehiko Nomura, Tadao Inoue

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Semiconductors, Multilayers, Defect detection, Databases, Inspection, Photomasks, Optical proximity correction, Analytical research, Data conversion, Algorithm development

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Showing 5 of 11 publications

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