Dr. Hideomi Hashiba Profile

Dr. Hideomi Hashiba

at Nihon Univ

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Proceedings Article | 26 September 2013 Paper

Titanium dioxide fine structures by RF magnetron sputter method deposited on an electron-beam resist mask

Hideomi Hashiba, Yuta Miyazaki, Sachiko Matsushita

Proceedings Volume 8816, 88161F (2013) https://doi.org/10.1117/12.2024360

KEYWORDS: Titanium, Transparent conductors, Annealing, Photonic crystals, Sputter deposition, Oxygen, Fabrication, Surface roughness, Protactinium, Titanium dioxide

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Titanium dioxide (TiO₂) has been draw attention for wide range of applications from photonic crystals for visible light range by its catalytic characteristics to tera-hertz range by its high refractive index. We present an experimental study of fabrication of fine structures of TiO₂ with a ZEP electron beam resist mask followed by Ti sputter deposition techniques. A TiO₂ thin layer of 150 nm thick was grown on an FTO glass substrate with a fine patterned ZEP resist mask by a conventional RF magnetron sputter method with Ti target. The deposition was carried out with argon-oxygen gases at a pressure of 5.0 x 10 ^-1 Pa in a chamber. During the deposition, ratio of Ar-O₂ gas was kept to the ratio of 2:1 and the deposition ratio was around 0.5 Å/s to ensure enough oxygen to form TiO₂ and low temperature to avoid deformation of fine pattern of the ZPU resist mask. Deposited TiO₂ layers are white-transparent, amorphous, and those roughnesses are around 7 nm. Fabricated TiO₂ PCs have wider TiO₂ slabs of 112 nm width leaving periodic 410 x 410 nm² air gaps. We also studied transformation of TiO₂ layers and TiO₂ fine structures by baking at 500 °C. XRD measurement for TiO₂ shows that the amorphous TiO2 transforms to rutile and anatase forms by the baking while keeping the same profile of the fine structures. Our fabrication method can be one of a promising technique to optic devices on researches and industrial area.

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