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Hiroaki Jiroku
at Seiko Epson Corp
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Publications (1)
Proceedings Article | 16 May 2003 Paper
High-performance polycrystalline silicon TFTs fabricated by high-temperature process with excimer laser annealing
Yoshifumi Tsunekawa, Tatsuya Shimoda, Hiroaki Jiroku, Mitsutoshi Miyasaka, Satoshi Inoue
Proceedings Volume 5004, (2003) https://doi.org/10.1117/12.482584
KEYWORDS: Silicon, Laser energy, Thermal oxidation, Annealing, Excimer lasers, Silicon films, Amorphous silicon, Oxides, Semiconductor lasers, Transmission electron microscopy
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