Dr. Hiroaki Nishiyama
at Osaka Univ
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 25 February 2010 Paper
M. Mizoshiri, H. Nishiyama, J. Nishii, Y. Hirata
Proceedings Volume 7589, 75891E (2010) https://doi.org/10.1117/12.842070
KEYWORDS: Refractive index, Femtosecond phenomena, Absorption, Lithography, Nonlinear optics, Diffraction gratings, Photoresist materials, Laser irradiation, Ultraviolet radiation, Thermal effects

SPIE Journal Paper | 1 February 2009 Open Access
JNP, Vol. 3, Issue 01, 030301, (February 2009) https://doi.org/10.1117/12.10.1117/1.3097264
KEYWORDS: Nanolithography, Femtosecond phenomena, Semiconductors, Photonic nanostructures, Polymers, Absorption, Photonic devices, 3D microstructuring, Spatial resolution, Microfabrication

Proceedings Article | 9 September 2008 Paper
M. Mizoshiri, H. Nishiyama, J. Nishii, Y. Hirata
Proceedings Volume 7039, 70390E (2008) https://doi.org/10.1117/12.795053
KEYWORDS: Silica, Microfluidics, Lenses, Femtosecond phenomena, Absorption, Fresnel lenses, Micromachining, Lithography, Silicon, Refractive index

Proceedings Article | 25 August 2008 Paper
H. Nishiyama, M. Mizoshiri, J. Nishii, Y. Hirata
Proceedings Volume 7056, 70561F (2008) https://doi.org/10.1117/12.795014
KEYWORDS: Femtosecond phenomena, Lenses, Microlens, Absorption, Lithography, Fresnel lenses, Silica, Plasma, Scanning electron microscopy, Laser processing

Proceedings Article | 12 February 2008 Paper
H. Nishiyama, M. Mizoshiri, J. Nishii, Y. Hirata
Proceedings Volume 6883, 68830E (2008) https://doi.org/10.1117/12.762542
KEYWORDS: Silica, Femtosecond phenomena, Absorption, Lenses, Plasma, Lithography, Glasses, Plasma etching, Oxygen, Micromachining

Showing 5 of 9 publications
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