Mr. Hiroki Miyai Profile

Hiroki Miyai

at Lasertec Corp

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 9 April 2020 Paper

Enabling EUVL high-volume manufacturing with actinic patterned mask inspection

Anna Tchikoulaeva, Hiroki Miyai, Tsunehito Kohyama, Kiwamu Takehisa, Haruhiko Kusunose

Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

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Proceedings Article | 25 November 2019

Actinic patterned mask defect inspection for EUV lithography

Hiroki Miyai, Tsunehito Kohyama, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Inspection, Image resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

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Proceedings Article | 18 March 2016 Paper

Advances in the detection capability on actinic blank inspection

Takeshi Yamane, Tsuyoshi Amano, Noriaki Takagi, Hidehiro Watanabe, Ichro Mori, Tomohisa Ino, Tomohiro Suzuki, Kiwamu Takehisa, Hiroki Miyai, Haruhiko Kusunose

Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII

KEYWORDS: Mirrors, Multilayers, Lithographic illumination, Defect detection, Light scattering, Inspection, CCD cameras, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

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Proceedings Article | 9 July 2015 Paper

Detection capability of Actinic Blank Inspection tool

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Hidehiro Watanabe, Ichiro Mori

Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

KEYWORDS: Mirrors, Lithographic illumination, Defect detection, Data modeling, Inspection, Ray tracing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

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Proceedings Article | 9 July 2015 Paper

Analysis of a low-aspect phase defect for actinic EUVL mask blank inspection

Takeshi Yamane, Tomohisa Ino, Hiroki Miyai

Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

KEYWORDS: Mirrors, Defect detection, Light scattering, Inspection, Reflectivity, Interference (communication), Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Prototyping

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Proceedings Article | 28 July 2014 Paper

Performance in practical use of actinic EUVL mask blank inspection

Takeshi Yamane, Yongdae Kim, Noriaki Takagi, Tsuneo Terasawa, Tomohisa Ino, Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose

Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI

KEYWORDS: Defect detection, Light scattering, Inspection, Surface roughness, CCD cameras, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Prototyping

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Proceedings Article | 28 July 2014 Paper

Defect analysis on actinic blank inspection tool

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Hidehiro Watanabe, Ichiro Mori

Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI

KEYWORDS: Lithography, Mirrors, Manufacturing, Inspection, Ray tracing, Photomasks, Extreme ultraviolet, Image classification, Extreme ultraviolet lithography, Geometrical optics

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Proceedings Article | 17 April 2014 Paper

Improvement of defect mitigation with EUV actinic blank inspection prototype for 16 nm hp

Tetsunori Murachi, Tsuyoshi Amano, Tomohiro Suzuki, Hiroki Miyai

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Coating, Inspection, Frequency modulation, Solids, Photomasks, Extreme ultraviolet, Fermium, Extreme ultraviolet lithography, Molybdenum, Prototyping

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SPIE Journal Paper | 6 March 2014

Effectiveness of extreme ultraviolet actinic blank inspection prototype for 16-nm half-pitch for mitigation of multilayered defects

Tetsunori Murachi, Tsuyoshi Amano, Tomohiro Suzuki, Hiroki Miyai

JM3 Vol. 13 Issue 01

KEYWORDS: Fermium, Extreme ultraviolet, Inspection, Frequency modulation, Photomasks, Multilayers, Extreme ultraviolet lithography, Molybdenum, Solids, Prototyping

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Proceedings Article | 28 June 2013 Paper

The capability of high magnification review function for EUV actinic blank inspection tool

Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Ichiro Mori

Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX

KEYWORDS: Mirrors, Multilayers, Switches, Defect detection, Ions, Inspection, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography

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Proceedings Article | 1 April 2013 Paper

EUV actinic blank inspection: from prototype to production

Anna Tchikoulaeva, Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Mirrors, Metrology, Defect detection, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Prototyping, Defect inspection

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Proceedings Article | 30 June 2012 Paper

EUV actinic blank inspection tool with a high magnification review mode

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX

KEYWORDS: Mirrors, Switches, Cameras, Inspection, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography, Electroluminescent displays, EUV optics

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Showing 5 of 12 publications

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