Dr. Hiroshi Fukuda
at
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author
Publications (36)

Proceedings Article | 20 September 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Polymers, Stochastic processes, Extreme ultraviolet, Photon transport, Monte Carlo methods, Absorption, Extreme ultraviolet lithography, Scattering, Diffusion, Lithography

SPIE Journal Paper | 12 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Stochastic processes, Monte Carlo methods, Polymers, Diffusion, Absorption, Extreme ultraviolet lithography, Extreme ultraviolet, Selenium, Photon transport, Photomasks

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Stochastic processes, Absorption, Extreme ultraviolet lithography, Diffusion, Photomasks, Polymers, Extreme ultraviolet, Monte Carlo methods, Chemically amplified resists

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Critical dimension metrology, Inspection, Optical inspection, Chemical reactions, Monte Carlo methods, Photomasks, Semiconducting wafers, Ranging

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Monte Carlo methods, Optimization (mathematics), Genetic algorithms, Computer simulations

Showing 5 of 36 publications
Conference Committee Involvement (1)
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
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