Mr. Hiroshi Ichinomiya Profile

Hiroshi Ichinomiya

at Tokyo Electron Kyushu Ltd

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 5 September 2018

Defect detection strategies and process partitioning for single-expose EUV patterning

Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Chris Robinson, Benjamin Briggs, Shravan Matham, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Heungsoo Choi, Barry Saville, Chet Lenox

JM3, Vol. 18, Issue 01, 011006, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011006

KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

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Proceedings Article | 28 March 2018 Presentation + Paper

Defect detection strategies and process partitioning for SE EUV patterning

Proceedings Volume 10583, 105830E (2018) https://doi.org/10.1117/12.2297362

KEYWORDS: Inspection, Semiconducting wafers, Etching, Stochastic processes, Extreme ultraviolet, Modulation, Defect detection, Extreme ultraviolet lithography, Coating, Electron beam lithography

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Proceedings Article | 19 March 2018 Paper

Resist coating and developing process technology toward EUV manufacturing sub-7nm node

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Yusaku Hashimoto, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Marc Demand, Philippe Foubert

Proceedings Volume 10583, 105831V (2018) https://doi.org/10.1117/12.2297203

KEYWORDS: Semiconducting wafers, Particles, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photoresist processing, System on a chip, Coating, Yield improvement

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Proceedings Article | 16 October 2017 Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hiroshi Ichinomiya, Masashi Enomoto, Kathleen Nafus, Philippe Foubert

Proceedings Volume 10450, 104501F (2017) https://doi.org/10.1117/12.2280388

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Photoresist processing, Neodymium, Scanners, Coating, Line width roughness, Extreme ultraviolet, High volume manufacturing, Manufacturing

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Proceedings Article | 27 March 2017 Paper

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Masashi Enomoto, Kathleen Nafus, Marc Demand, Philippe Foubert

Proceedings Volume 10143, 1014326 (2017) https://doi.org/10.1117/12.2257931

KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Coating, High volume manufacturing, Semiconducting wafers, Neodymium, Particles, System on a chip, Silicon

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