Dr. Hiroshi Nozue Profile

Dr. Hiroshi Nozue

President

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 30 October 2007 Paper

Paper

Coping with double-patterning/exposure lithography by EB mask writer EBM-6000

Takashi Kamikubo, Rieko Nishimura, Kaoru Tsuruta, Kiyoshi Hattori, Jun Takamatsu, Shusuke Yoshitake, Hiroshi Nozue, Hitoshi Sunaoshi, Shuichi Tamamushi

Proceedings Volume 6730, 673031 (2007) https://doi.org/10.1117/12.747745

KEYWORDS: Photomasks, Error analysis, Double patterning technology, Lithography, Chromium, Scanners, Critical dimension metrology, Semiconducting wafers, Control systems, 193nm lithography

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Proceedings Article | 20 May 2004 Paper

Paper

Recent progress of LEEPL mask technology

Hiroshi Nozue, Akira Yoshida, Akihiro Endo

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535278

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Electron beams, Contamination, Printing, Silicon, Critical dimension metrology, Mask cleaning, Vacuum ultraviolet

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Proceedings Article | 20 May 2004 Paper

Paper

Evaporated resist for the fabrication and replication of LEEPL mask

Melanie Cloutier, Yousef Awad, Eric Lavallee, David Turcotte, Jacques Beauvais, Dominique Drouin, Lau Kien Mun, Pan Yang, Pierre Lafrance, Ron Legario, Akira Yoshida, Hiroshi Nozue

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535747

KEYWORDS: Photomasks, Charged-particle lithography, Etching, Electron beam lithography, Reactive ion etching, Mask making, Nickel, Optical lithography, Plating, Lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Performance of the beta tool for low-energy electron-beam proximity-projection lithography (LEEPL)

Akira Yoshida, Haruo Kasahara, Akira Higuchi, Hiroshi Nozue, Akihiro Endo, Nobuo Shimazu

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484422

KEYWORDS: Charged-particle lithography, Photomasks, Semiconducting wafers, Lithography, Distortion, Scanning electron microscopy, Electron beams, Particles, Optical alignment, Electron beam lithography

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Proceedings Article | 16 August 2002 Paper

Paper

Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with B-tool development

Nobuo Shimazu, Hiroshi Nozue, Akihiro Endo, Akira Higuchi, T. Ise, Toyoharu Fukui, N. Yasumitsu, Tsutomu Miyatake, Norimiti Anazawa

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479360

KEYWORDS: Charged-particle lithography, Photomasks, Semiconducting wafers, Electron beam lithography, Semiconductors, Projection lithography, Lithography, Optical alignment, Electron beams, X-ray lithography

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Proceedings Article | 5 September 2001 Paper

Paper

Fabricating 100-nm line patterns with high-transmittance ArF attenuated phase-shift masks

Haruo Iwasaki, Shinji Ishida, K. Tonai, Hiroshi Nozue

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438333

KEYWORDS: Transmittance, Photomasks, Logic devices, Critical dimension metrology, Phase shifts, Printing, Semiconducting wafers, Binary data, Optical proximity correction, Scanners

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Proceedings Article | 20 August 2001 Paper

Paper

Development of data conversion system for electron-beam projection lithography (EPL) mask

Yasuhisa Yamada, Hideo Kobinata, Takao Tamura, Mami Miyasaka, Tatsuya Sakamoto, Yuzo Ogawa, Kenichi Takada, Hiroshi Yamashita, Hiroshi Nozue

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436678

KEYWORDS: Data conversion, Photomasks, Electron beams, Projection lithography, Electron beam lithography, Lithography, Semiconducting wafers, Astatine, Genetic algorithms, Wafer-level optics

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Proceedings Article | 20 August 2001 Paper

Paper

Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)

Takao Tamura, Takahiro Ema, Hiroshi Nozue, Tamoya Sugahara, Akio Sugano, Jun Nitta

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436693

KEYWORDS: Vestigial sideband modulation, Scanning electron microscopy, Projection lithography, Computer programming, Electron beams, Photomasks, Lithography, Electron beam lithography, Holons, Beam shaping

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Proceedings Article | 21 July 2000 Paper

Paper

Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography (EPL)

Mami Miyasaka, Kenichi Tokunaga, Fumihiro Koba, Hiroshi Yamashita, Ken Nakajima, Hiroshi Nozue

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390070

KEYWORDS: Quantum efficiency, Projection lithography, Lithography, Electron beam direct write lithography, Electron beam lithography, Electron beams, Photomasks, Scanning electron microscopy, Molecules, Chemical analysis

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Proceedings Article | 5 June 1998 Paper

Paper

Optimization of pattern shape in electron-beam cell projection lithography

Takahiro Ema, Hiroshi Yamashita, Ken Nakajima, Hideo Kobinata, Hiroshi Nozue

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309601

KEYWORDS: Photomasks, Projection lithography, Factor analysis, Optical simulations, Scattering, Projection systems, Lithium, Laser scattering, Lithography, Scanning electron microscopy

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Proceedings Article | 5 June 1998 Paper

Paper

Highly accurate stitching method between cell projection and variably shaped e-beam shots

Yoshikatsu Kojima, Naka Onoda, Kenichi Tokunaga, Ken Nakajima, Hiroshi Nozue

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309602

KEYWORDS: Signal detection, Error analysis, Electron beam lithography, Lithography, Electron beams, Integrated circuits, Semiconducting wafers, Photomasks, Calibration, Signal to noise ratio

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Proceedings Article | 28 July 1997 Paper

Paper

Mask bias effects in e-beam cell projection lithography

Takahiro Ema, Hiroshi Yamashita, Ken Nakajima, Hiroshi Nozue

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277276

KEYWORDS: Photomasks, Lithium, Projection lithography, Electron beam lithography, Electron beams, Semiconducting wafers, Fabrication, Optical lithography, Dry etching, Metals

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Proceedings Article | 7 July 1997 Paper

Paper

0.15-um pattern formation using cell projection electron-beam direct writing with variable shot size

Takao Tamura, Hiroshi Yamashita, Ken Nakajima, Hiroshi Nozue

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275779

KEYWORDS: Vestigial sideband modulation, Monte Carlo methods, Electron beams, Lithium, Critical dimension metrology, Electron beam lithography, Lithography, Manufacturing, Beam shaping, Interfaces

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Proceedings Article | 7 July 1997 Paper

Paper

One-dimensional calculation method for proximity effect correction in cell projection electron-beam direct writing

Yasuhisa Yamada, Takao Tamura, Ken Nakajima, Hiroshi Nozue

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275792

KEYWORDS: Electroluminescence, Data conversion, Electron beams, Scattering, Critical dimension metrology, Optical resolution, Optical lithography, Electron beam lithography, Lithography, Photoresist processing

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Proceedings Article | 24 July 1996 Paper

Paper

Defect printability analysis in electron-beam cell projection lithography

Katsuyuki Itoh, Hiroshi Yamashita, Takahiro Ema, Hiroshi Nozue

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245201

KEYWORDS: Photomasks, Bridges, Semiconducting wafers, Projection lithography, Projection systems, Electron beam lithography, Inspection, Manufacturing, Silicon, Beam shaping

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Proceedings Article | 8 August 1993 Paper

Paper

NA and optimization for high-NA i-line lithography

Koji Yamanaka, Haruo Iwasaki, Hiroshi Nozue, Kunihiko Kasama

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150435

KEYWORDS: Photoresist processing, Lithographic illumination, Lithography, Photomasks, Optical lithography, Semiconducting wafers, Super resolution, Modulation transfer functions, Excimer lasers, Wafer-level optics

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Proceedings Article | 1 June 1992 Paper

Paper

Fabrication and evaluation of chromium/phase-shifter/quartz structure phase-shift mask

Tadao Yasuzato, Haruo Iwasaki, Hiroshi Nozue, Kunihiko Kasama

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130324

KEYWORDS: Phase shifts, Photomasks, Chromium, Optical lithography, Semiconducting wafers, Chlorine, Photoresist processing, Optical alignment, Mask making, Etching

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Proceedings Article | 1 June 1992 Paper

Paper

Resolution improvement with annular illumination

Keiichiro Tounai, Hiroyoshi Tanabe, Hiroshi Nozue, Kunihiko Kasama

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130365

KEYWORDS: Spatial frequencies, Optical lithography, Lithographic illumination, Photoresist processing, Lithography, Microscopes, Printing, Light, Light sources, Photomasks

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Proceedings Article | 1 July 1991 Paper

Paper

Simulation analysis of deep-UV chemically amplified resist

Takeshi Ohfuji, Masanobu Soenosawa, Hiroshi Nozue, Kunihiko Kasama

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44794

KEYWORDS: Reflectivity, Lithography, Chemical analysis, Chemically amplified resists, Absorbance, Deep ultraviolet, Photoresist processing, Optical lithography, Phase shifting, Lenses

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Proceedings Article | 1 June 1991 Paper

Paper

Dissolution kinetics of high-resolution novolac resists

Katsuyuki Itoh, Koji Yamanaka, Hiroshi Nozue, Kunihiko Kasama

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46397

KEYWORDS: Picture Archiving and Communication System, FT-IR spectroscopy, Semiconducting wafers, Barium, Photoemission spectroscopy, Hydrogen, Silicon, X-rays, Molecules, Fourier spectroscopy

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Showing 5 of 20 publications

Conference Committee Involvement (6)

SPIE Photomask Technology

10 September 2013 | Monterey, California, United States

Photomask Technology

11 September 2012 | Monterey, California, United States

Photomask Technology

19 September 2011 | Monterey, California, United States

Photomask Technology

13 September 2010 | Monterey, California, United States

Photomask Technology

15 September 2009 | Monterey, California, United States

Showing 5 of 6 Conference Committees

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