Dr. Hiroshi Nozue
President
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Scanners, Error analysis, Chromium, Control systems, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Proceedings Article | 20 May 2004 Paper
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Nickel, Photomasks, Mask making, Plating, Reactive ion etching, Charged-particle lithography

Proceedings Article | 20 May 2004 Paper
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Electron beams, Contamination, Silicon, Printing, Photomasks, Critical dimension metrology, Vacuum ultraviolet, Semiconducting wafers, Charged-particle lithography, Mask cleaning

Proceedings Article | 16 June 2003 Paper
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Particles, Distortion, Scanning electron microscopy, Photomasks, Optical alignment, Semiconducting wafers, Charged-particle lithography

Proceedings Article | 16 August 2002 Paper
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Electron beams, Photomasks, Optical alignment, Semiconducting wafers, X-ray lithography, Projection lithography, Charged-particle lithography

Showing 5 of 20 publications
Conference Committee Involvement (6)
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Photomask Technology
13 September 2010 | Monterey, California, United States
Photomask Technology
15 September 2009 | Monterey, California, United States
Showing 5 of 6 Conference Committees
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