Dr. Hiroyoshi Tanabe
Researcher at Tokyo Institute of Technology
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11614, Design-Process-Technology Co-optimization XV
KEYWORDS: Lithography, Finite-difference time-domain method, Convolutional neural networks, Waveguides, Polarization, 3D modeling, Photomasks, Extreme ultraviolet, Electromagnetic simulation, Systems modeling

Proceedings Article | 20 September 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Lithography, Finite-difference time-domain method, Optical lithography, Convolutional neural networks, Fourier transforms, 3D modeling, Photomasks, Extreme ultraviolet, Optical simulations, Systems modeling

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Data modeling, Scattering, Sensors, Light scattering, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Phase measurement, Phase shifts

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Refractive index, Phase shifting, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Phase shifting, Reflection, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Cadmium sulfide, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 30 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 28 August 2003

Conference Committee Involvement (4)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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