Dr. Hiroyuki Mizuno Profile

Dr. Hiroyuki Mizuno

Specialist at Toshiba Corp

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 8 April 2011 Paper

Study of ion implantation into EUV resist for LWR improvement

Yukiko Kikuchi, Daisuke Kawamura, Hiroyuki Mizuno

Proceedings Volume 7969, 79692H (2011) https://doi.org/10.1117/12.879359

KEYWORDS: Line width roughness, Etching, Ion implantation, Extreme ultraviolet, Ions, Photomasks, Extreme ultraviolet lithography, Dry etching, Semiconducting wafers, Photoresist processing

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SPIE Journal Paper | 1 January 2011

Effective exposure dose monitoring technique in extreme ultraviolet lithography

Yumi Nakajima, Kentaro Kasa, Takashi Sato, Masafumi Asano, Suigen Kyoh, Hiroyuki Mizuno

JM3, Vol. 10, Issue 1, 013005, (January 2011) https://doi.org/10.1117/12.10.1117/1.3533231

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

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Proceedings Article | 27 May 2010 Paper

Effective-exposure-dose monitoring technique in EUV lithography

Yumi Nakajima, Kentaro Kasa, Takashi Sato, Masafumi Asano, Suigen Kyoh, Hiroyuki Mizuno

Proceedings Volume 7748, 774824 (2010) https://doi.org/10.1117/12.868924

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Manufacturing, Diffraction, Semiconducting wafers, Critical dimension metrology, Optical lithography, Lithographic illumination, Extreme ultraviolet

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Proceedings Article | 23 March 2010 Paper

EUV lithography at the 22nm technology node

Obert Wood, Chiew-Seng Koay, Karen Petrillo, Hiroyuki Mizuno, Sudhar Raghunathan, John Arnold, Dave Horak, Martin Burkhardt, Gregory McIntyre, Yunfei Deng, Bruno La Fontaine, Uzo Okoroanyanwu, Tom Wallow, Guillaume Landie, Theodorus Standaert, Sean Burns, Christopher Waskiewicz, Hirohisa Kawasaki, James H.-C. Chen, Matthew Colburn, Bala Haran, Susan S.-C. Fan, Yunpeng Yin, Christian Holfeld, Jens Techel, Jan-Hendrik Peters, Sander Bouten, Brian Lee, Bill Pierson, Bart Kessels, Robert Routh, Kevin Cummings

Proceedings Volume 7636, 76361M (2010) https://doi.org/10.1117/12.847049

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Immersion lithography, Double patterning technology, Optical proximity correction, Printing, Lithography, Optical lithography, Metals

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Proceedings Article | 11 May 2009 Paper

Thorough characterization of an EUV mask

Hiroyuki Mizuno, Gregory McIntyre, Chiew-seng Koay, Martin Burkhardt, Long He, John Hartley, Corbet Johnson, Sudharshanan Raghunathan, Kenneth Goldberg, Iacopo Mochi, Bruno La Fontaine, Obert Wood

Proceedings Volume 7379, 73790J (2009) https://doi.org/10.1117/12.824260

KEYWORDS: Photomasks, Scanning electron microscopy, Line edge roughness, Extreme ultraviolet, Atomic force microscopy, Mirrors, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction

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Proceedings Article | 1 April 2009 Paper

Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection tools

Thomas Wallow, Bill Pierson, Hiroyuki Mizuno, Anita Fumar-Pici, Karen Petrillo, Chris Anderson, Patrick Naulleau, Steven Hansen, Yunfei Deng, Koen van Ingen Schenau, Chiew-Seng Koay, Linda Ohara, Sang-In Han, Robert Watso, Lior Huli, Martin Burkhardt, Obert Wood, Joerg Mallmann, Bart Kessels, Robert Routh, Kevin Cummings

Proceedings Volume 7273, 72733T (2009) https://doi.org/10.1117/12.814457

KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, Data modeling, Lithography, Diagnostics, Photoresist processing, Nanoimprint lithography, Diffusion, Reticles

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Proceedings Article | 20 March 2009 Paper

Characterization of a 0.25NA full-field EUV exposure tool

Oleg Kritsun, Bruno La Fontaine, Yudong Hao, Jie Li, Obert Wood, Sudharshanan Raghunathan, Tim Brunner, Chiew-Seng Koay, Hiroyuki Mizuno

Proceedings Volume 7271, 727121 (2009) https://doi.org/10.1117/12.816545

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Scatterometry, Extreme ultraviolet, Reticles, Overlay metrology, Metrology, Diffraction gratings

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Proceedings Article | 18 March 2009 Paper

EUVL reticle defectivity evaluation

A. Tchikoulaeva, U. Okoroanyanwu, O. Wood, B. La Fontaine, C. Holfeld, S. Kini, M. Peikert, C. Boye, C.-S. Koay, K. Petrillo, H. Mizuno

Proceedings Volume 7271, 727117 (2009) https://doi.org/10.1117/12.815525

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Wafer inspection, Scanning electron microscopy, Photomasks, Defect detection, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers

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Proceedings Article | 18 March 2009 Paper

Exposure tool settings and OPC strategies for EUV lithography at the 16-nm node

Yunfei Deng, Jongwook Kye, Bruno La Fontaine, Tom Wallow, Obert Wood, Harry Levinson, Anita Fumar-Pici, Hiroyuki Mizuno, Chiew-seng Koay, Greg McIntyre

Proceedings Volume 7271, 727119 (2009) https://doi.org/10.1117/12.814953

KEYWORDS: Critical dimension metrology, Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, EUV optics, Diffusion, Lithographic illumination, Photomasks, Image processing, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

Flare evaluation of ASML alpha demo tool

Hiroyuki Mizuno, Gregory McIntyre, Chiew-seng Koay, Martin Burkhardt, Bruno La Fontaine, Obert Wood

Proceedings Volume 7271, 72710U (2009) https://doi.org/10.1117/12.814312

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Diffraction gratings, Extreme ultraviolet, Reflection, Diffraction, Lithography, Reticles, Semiconducting wafers, Nanotechnology

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Proceedings Article | 18 March 2009 Paper

Modeling and experiments of non-telecentric thick mask effects for EUV lithography

Gregory McIntyre, Chiew-seng Koay, Martin Burkhardt, Hiro Mizuno, Obert Wood

Proceedings Volume 7271, 72711C (2009) https://doi.org/10.1117/12.813536

KEYWORDS: Photomasks, Extreme ultraviolet, Diffusion, Extreme ultraviolet lithography, Imaging systems, Semiconducting wafers, Scanners, Lithography, Systems modeling, Finite-difference time-domain method

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Proceedings Article | 18 March 2009 Open Access

Integration of EUV lithography in the fabrication of 22-nm node devices

Proceedings Volume 7271, 727104 (2009) https://doi.org/10.1117/12.814379

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Semiconducting wafers, Etching, Optical lithography, Photoresist processing, Lithography, Imaging systems, Copper

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Proceedings Article | 17 October 2008 Paper

An investigation of EUV lithography defectivity

Kevin Cummings, Thomas Laursen, Bill Pierson, Sang-in Han, Robert Watso, Youri van Dommelen, Brian Lee, Yunfei Deng, Bruno La Fontaine, Thomas Wallow, Uzo Okoroanyanwu, Obert Wood, Anna Tchikoulaeva, Christian Holfeld, Jan Hendrick Peters, Chiew-seng Koay, Karen Petrillo, Tony DiBiase, Sumanth Kini, Hiroyuki Mizuno

Proceedings Volume 7122, 71222G (2008) https://doi.org/10.1117/12.801528

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Inspection, Particles, Scanning electron microscopy, Wafer inspection, Defect inspection, Silicon

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Proceedings Article | 26 March 2008 Paper

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Harry Levinson, Sarah McGowan, Uzodinma Okoroanyanwu, Rolf Seltmann, Cyrus Tabery, Anna Tchikoulaeva, Tom Wallow, Obert Wood, John Arnold, Don Canaperi, Matthew Colburn, Kurt Kimmel, Chiew-Seng Koay, Erin Mclellan, Dave Medeiros, Satyavolu Papa Rao, Karen Petrillo, Yunpeng Yin, Hiroyuki Mizuno, Sander Bouten, Michael Crouse, Andre van Dijk, Youri van Dommelen, Judy Galloway, Sang-In Han, Bart Kessels, Brian Lee, Sjoerd Lok, Brian Niekrewicz, Bill Pierson, Robert Routh, Emil Schmit-Weaver, Kevin Cummings, James Word

Proceedings Volume 6921, 69210P (2008) https://doi.org/10.1117/12.772933

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Transistors, Extreme ultraviolet, Optical proximity correction, Photoresist processing, Etching, Metals, Scanners

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Proceedings Article | 24 March 2006 Paper

A character projection low energy electron beam direct writing system for device of small production lot with a variety of design

Fumihiko Nakamura, Katsuhide Watanabe, Hidetoshi Kinoshita, Hiroyuki Shinozaki, Yasushi Kojima, Satoshi Morita, Kouhei Noguchi, Norihiro Yamaguchi, Hisashi Isokawa, Kazuhiko Kushitani, Takayuki Satoh, Takeshi Koshiba, Takumi Oota, Tetsuro Nakasugi, Hiroyuki Mizuno

Proceedings Volume 6151, 61512A (2006) https://doi.org/10.1117/12.655963

KEYWORDS: Semiconducting wafers, Electron beam direct write lithography, Control systems, Electron beams, Vestigial sideband modulation, Data conversion, Beam shaping, Photomasks, Optical alignment, Amplifiers

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Showing 5 of 15 publications

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