Dr. Hiroyuki Mizuno
Specialist at Toshiba Corp
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Line width roughness, Etching, Ion implantation, Extreme ultraviolet, Ions, Photomasks, Extreme ultraviolet lithography, Dry etching, Semiconducting wafers, Photoresist processing

SPIE Journal Paper | 1 January 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Manufacturing, Diffraction, Semiconducting wafers, Critical dimension metrology, Optical lithography, Lithographic illumination, Extreme ultraviolet

Proceedings Article | 23 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Immersion lithography, Double patterning technology, Optical proximity correction, Printing, Lithography, Optical lithography, Metals

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Photomasks, Scanning electron microscopy, Line edge roughness, Extreme ultraviolet, Atomic force microscopy, Mirrors, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction

Showing 5 of 15 publications
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