Mr. Hiroyuki Nagasaka Profile

Hiroyuki Nagasaka

at Nikon Corp

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 4 December 2008 Paper

Immersion lithography: its history, current status and future prospects

Soichi Owa, Hiroyuki Nagasaka

Proceedings Volume 7140, 714015 (2008) https://doi.org/10.1117/12.804709

KEYWORDS: Immersion lithography, Semiconducting wafers, Lithography, Water, Liquids, Optical lithography, Double patterning technology, Extreme ultraviolet lithography, Semiconductors, Projection systems

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Proceedings Article | 7 March 2008 Paper

Studies of high index immersion lithography

Yasuhiro Ohmura, Hiroyuki Nagasaka, Tomoyuki Matsuyama, Toshiharu Nakashima, Teruki Kobayashi, Motoi Ueda, Soichi Owa

Proceedings Volume 6924, 692413 (2008) https://doi.org/10.1117/12.771622

KEYWORDS: Lithography, Surface finishing, Transparency, Immersion lithography, Refractive index, Polarization, Birefringence, Control systems, Point spread functions, Lens design

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Proceedings Article | 3 May 2007 Paper

Current status of water immersion lithography and prospect of higher index method

Soichi Owa, Katsushi Nakano, Hiroyuki Nagasaka, Hirotaka Kohno, Yasuhiro Ohmura, Martin McCallum

Proceedings Volume 6533, 653304 (2007) https://doi.org/10.1117/12.731916

KEYWORDS: Semiconducting wafers, Imaging systems, Double patterning technology, Water, Immersion lithography, Manufacturing, Lithography, Refractive index, Photoresist developing, Thin film coatings

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Proceedings Article | 26 March 2007 Paper

Current status of high-index immersion lithography development

Yasuhiro Ohmura, Toshiharu Nakashima, Hiroyuki Nagasaka, Ayako Sukegawa, Satoshi Ishiyama, Koichi Kamijo, Masahiko Shinkai, Soichi Owa

Proceedings Volume 6520, 652006 (2007) https://doi.org/10.1117/12.711252

KEYWORDS: Microfluidics, Immersion lithography, Lithography, Refractive index, Water, Lens design, Semiconducting wafers, Absorption, Birefringence, Polarization

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Proceedings Article | 15 March 2006 Paper

Current status and future prospect of immersion lithography

Soichi Owa, Hiroyuki Nagasaka, Katsushi Nakano, Yasuhiro Ohmura

Proceedings Volume 6154, 615408 (2006) https://doi.org/10.1117/12.656887

KEYWORDS: Optics manufacturing, Semiconducting wafers, Water, Resonance energy transfer, Double patterning technology, Immersion lithography, Scanners, Combined lens-mirror systems, Particles, Projection systems

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Proceedings Article | 12 May 2005 Paper

Full-field exposure tools for immersion lithography

Soichi Owa, Hiroyuki Nagasaka, Yuuki Ishii, Kenichi Shiraishi, Shigeru Hirukawa

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599352

KEYWORDS: Resonance energy transfer, Semiconducting wafers, Thin film coatings, Combined lens-mirror systems, Contamination, Phase shifts, Polarization, Projection systems, Critical dimension metrology, Inspection

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Proceedings Article | 28 May 2004 Paper

Feasibility of immersion lithography

Soichi Owa, Hiroyuki Nagasaka, Yuuki Ishii, Osamu Hirakawa, Taro Yamamoto

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536852

KEYWORDS: Polarization, Semiconducting wafers, Water, Immersion lithography, Reflectivity, Projection systems, Optical sensing, Photomasks, Particles, Optical design

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SPIE Journal Paper | 1 January 2004

Advantage and feasibility of immersion lithography

Soichi Owa, Hiroyuki Nagasaka

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637593

KEYWORDS: Immersion lithography, Semiconducting wafers, Water, Liquids, Photomasks, Lithography, Polarization, Projection systems, Binary data, Temperature metrology

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Proceedings Article | 26 June 2003 Paper

Immersion lithography: its potential performance and issues

Soichi Owa, Hiroyuki Nagasaka

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.504599

KEYWORDS: Immersion lithography, Water, Semiconducting wafers, Liquids, Photomasks, Projection systems, Temperature metrology, Lithography, Polarization, Binary data

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Proceedings Article | 26 June 2003 Paper

Nikon F2 exposure tool development

Soichi Owa, Yukako Matsumoto, Yasuhiro Ohmura, Shigeru Sakuma, Takashi Aoki, Jin Nishikawa, Hiroyuki Nagasaka, Takeyuki Mizutani, Naomasa Shiraishi, Kazuhiro Kido, Issei Tanaka, Jun Nagatsuka

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485451

KEYWORDS: Pellicles, Projection systems, Photomasks, Lithography, Coating, Birefringence, Crystals, Binary data, Refractive index, Optical design

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Proceedings Article | 30 July 2002 Paper

Development of environmental control technologies for 157-nm lithography at ASET

Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Hiroyuki Nagasaka, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Keiji Egawa, Takehito Watanabe, Ikuo Uchino, Akira Sumitani, Kiyoharu Nakao

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474622

KEYWORDS: Adhesives, Oxygen, Metals, Quartz, Lithography, Systems modeling, Transmittance, Information operations, Lenses, Scanning electron microscopy

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Showing 5 of 11 publications

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