Mr. Hiroyuki Nagasaka Profile

Hiroyuki Nagasaka

at Nikon Corp

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 4 December 2008 Paper

Immersion lithography: its history, current status and future prospects

Soichi Owa, Hiroyuki Nagasaka

Proceedings Volume 7140, 714015 (2008) https://doi.org/10.1117/12.804709

KEYWORDS: Immersion lithography, Semiconducting wafers, Lithography, Water, Liquids, Optical lithography, Double patterning technology, Extreme ultraviolet lithography, Semiconductors, Projection systems

Read Abstract +

Proceedings Article | 7 March 2008 Paper

Studies of high index immersion lithography

Soichi Owa, Tomoyuki Matsuyama, Yasuhiro Ohmura, Motoi Ueda, Teruki Kobayashi, Toshiharu Nakashima, Hiroyuki Nagasaka

Proceedings Volume 6924, 692413 (2008) https://doi.org/10.1117/12.771622

KEYWORDS: Lithography, Surface finishing, Transparency, Immersion lithography, Refractive index, Polarization, Birefringence, Control systems, Point spread functions, Lens design

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Current status of water immersion lithography and prospect of higher index method

Hiroyuki Nagasaka, Soichi Owa, Katsushi Nakano, Martin McCallum, Yasuhiro Ohmura, Hirotaka Kohno

Proceedings Volume 6533, 653304 (2007) https://doi.org/10.1117/12.731916

KEYWORDS: Semiconducting wafers, Imaging systems, Double patterning technology, Water, Immersion lithography, Manufacturing, Lithography, Refractive index, Photoresist developing, Thin film coatings

Read Abstract +

Proceedings Article | 26 March 2007 Paper

Current status of high-index immersion lithography development

Yasuhiro Ohmura, Soichi Owa, Ayako Sukegawa, Hiroyuki Nagasaka, Koichi Kamijo, Toshiharu Nakashima, Satoshi Ishiyama, Masahiko Shinkai

Proceedings Volume 6520, 652006 (2007) https://doi.org/10.1117/12.711252

KEYWORDS: Microfluidics, Immersion lithography, Lithography, Refractive index, Water, Lens design, Semiconducting wafers, Absorption, Birefringence, Polarization

Read Abstract +

Proceedings Article | 15 March 2006 Paper

Current status and future prospect of immersion lithography

Katsushi Nakano, Yasuhiro Ohmura, Hiroyuki Nagasaka, Soichi Owa

Proceedings Volume 6154, 615408 (2006) https://doi.org/10.1117/12.656887

KEYWORDS: Optics manufacturing, Semiconducting wafers, Water, Resonance energy transfer, Double patterning technology, Immersion lithography, Scanners, Combined lens-mirror systems, Particles, Projection systems

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Full-field exposure tools for immersion lithography

Kenichi Shiraishi, Hiroyuki Nagasaka, Soichi Owa, Shigeru Hirukawa, Yuuki Ishii

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599352

KEYWORDS: Resonance energy transfer, Semiconducting wafers, Thin film coatings, Combined lens-mirror systems, Contamination, Phase shifts, Polarization, Projection systems, Critical dimension metrology, Inspection

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Feasibility of immersion lithography

Yuuki Ishii, Hiroyuki Nagasaka, Taro Yamamoto, Osamu Hirakawa, Soichi Owa

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536852

KEYWORDS: Polarization, Semiconducting wafers, Water, Immersion lithography, Reflectivity, Projection systems, Optical sensing, Photomasks, Particles, Optical design

Read Abstract +

SPIE Journal Paper | 1 January 2004

Advantage and feasibility of immersion lithography

Soichi Owa, Hiroyuki Nagasaka

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637593

KEYWORDS: Immersion lithography, Semiconducting wafers, Water, Liquids, Photomasks, Lithography, Polarization, Projection systems, Binary data, Temperature metrology

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Immersion lithography: its potential performance and issues

Soichi Owa, Hiroyuki Nagasaka

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.504599

KEYWORDS: Immersion lithography, Water, Semiconducting wafers, Liquids, Photomasks, Projection systems, Temperature metrology, Lithography, Polarization, Binary data

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Nikon F2 exposure tool development

Jun Nagatsuka, Soichi Owa, Yukako Matsumoto, Shigeru Sakuma, Yasuhiro Ohmura, Kazuhiro Kido, Jin Nishikawa, Hiroyuki Nagasaka, Takeyuki Mizutani, Takashi Aoki, Issei Tanaka, Naomasa Shiraishi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485451

KEYWORDS: Pellicles, Projection systems, Photomasks, Lithography, Coating, Birefringence, Crystals, Binary data, Refractive index, Optical design

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Development of environmental control technologies for 157-nm lithography at ASET

Yasuaki Fukuda, Hiroyuki Nagasaka, Akira Sumitani, Ikuo Uchino, Takehito Watanabe, Soichi Owa, Kiyoharu Nakao, Fumika Yoshida, Keiji Egawa, Seiji Takeuchi, Youichi Kawasa, Takashi Aoki

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474622

KEYWORDS: Adhesives, Oxygen, Metals, Quartz, Lithography, Systems modeling, Transmittance, Information operations, Lenses, Scanning electron microscopy

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years