Hiroyuki Shigemura
at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (27)

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Signal to noise ratio, Defect detection, Image processing, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Defect inspection

Proceedings Article | 7 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Etching, Ions, Silicon, Reflectivity, Image resolution, Ion beams, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Proceedings Article | 29 March 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Multilayers, Defect detection, Inspection, Scanning electron microscopy, Printing, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Defect detection, Particles, Inspection, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 27 publications
Conference Committee Involvement (3)
Photomask Japan 2011
13 April 2011 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
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