Dr. Hitoshi Kosugi
EUV Project Leader at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Wafer-level optics, Reticles, Optical lithography, Inspection, Optical inspection, Wafer inspection, Directed self assembly, Epitaxy, Semiconducting wafers, Defect inspection

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Image processing, Coating, Inspection, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Standards development, Plasma

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Image processing, Scanners, Particles, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Contamination, Silica, Scanners, Particles, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers, Particle contamination

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Thin films, Contamination, Data modeling, Calibration, Etching, Coating, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 17 publications
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