Dr. Ho-Chul Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Spectroscopy, Silicon, Reflectivity, Scatterometry, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Reticles, Metrology, Optical lithography, Scanners, Photoresist materials, Image sensors, Semiconducting wafers, Optics manufacturing, Overlay metrology, Fiber optic illuminators

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Refractive index, Calibration, Scanners, Diffusion, Scanning electron microscopy, Nanoimprint lithography, Data conversion, Device simulation, Instrument modeling

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Electronics, Optical lithography, Scattering, Light scattering, Chromium, Optical testing, Optical proximity correction, Critical dimension metrology, Stray light

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Spectrum analysis, Electronics, Lithographic illumination, Scanners, Monte Carlo methods, Image enhancement, Double patterning technology, Critical dimension metrology, Resolution enhancement technologies

Showing 5 of 8 publications
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