Mr. Hojune Lee Profile

Hojune Lee

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 10 April 2024 Presentation

MBMW's comprehensive requirements and roles for next EUV era and its mass production

Inhwan Noh, Jongmun Park, Heebom Kim, Jin Choi, Sang-Hee Lee, Hojune Lee, Byung-Sup Ahn, Youngsu Sung

Proceedings Volume PC12956, PC1295605 (2024) https://doi.org/10.1117/12.3009572

KEYWORDS: Extreme ultraviolet, Logic

Read Abstract +

Proceedings Article | 6 April 2015 Paper

Magnetron sputtering for the production of EUV mask blanks

Patrick Kearney, Tat Ngai, Anil Karumuri, Jung Yum, Hojune Lee, David Gilmer, Tuan Vo, Frank Goodwin

Proceedings Volume 9422, 94220H (2015) https://doi.org/10.1117/12.2087773

KEYWORDS: Photomasks, Extreme ultraviolet, Reflectivity, Sputter deposition, Multilayers, Semiconducting wafers, Ion beams, Manufacturing, Silicon, EUV optics

Read Abstract +

Proceedings Article | 16 September 2014 Paper

Study of heating effect in multi-beam mask writing

Jongsu Kim, Jihoon Kang, Inhwan Noh, Sookhyun Lee, Soeun Shin, Sungil Lee, Hyunchung Ha, Hojune Lee, Jin Choi, Sanghee Lee, Inkyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9235, 92350Y (2014) https://doi.org/10.1117/12.2065930

KEYWORDS: Finite element methods, Critical dimension metrology, Vestigial sideband modulation, Photomasks, Beam shaping, Chemical reactions, Electron beams, Heat flux, Chemical analysis, Thermal effects

Read Abstract +

Proceedings Article | 28 July 2014 Paper

Challenges and technical requirements for multi-beam mask writer development

Sang Hee Lee, Jin Choi, Ho June Lee, In Kyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9256, 925606 (2014) https://doi.org/10.1117/12.2069731

KEYWORDS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Scattering, Laser scattering, Monte Carlo methods, Image processing, Backscatter, Beam controllers, Calibration

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Improvement of mask CD uniformity for below 45-nm node technology

Hojune Lee, Seokjong Bae, Junghoon Park, Dongseok Nam, Byunggook Kim, Sang-Gyun Woo, HanKu Cho

Proceedings Volume 6730, 67302Z (2007) https://doi.org/10.1117/12.746810

KEYWORDS: Etching, Critical dimension metrology, Chromium, Photomasks, Curium, Ions, Electron beams, Plasma etching, Photoresist processing, Information operations

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Required mask specification for mass production devices below 65-nm design node

Dongseok Nam, Soohan Choi, Jonggul Doh, Young-hwa Noh, Hojune Lee, Yu-jeung Sin, Bo-hye Kim, Man-kyu Kang, Byunggook Kim, Seong-woon Choi, Woosung Han

Proceedings Volume 6349, 634928 (2006) https://doi.org/10.1117/12.686534

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Photoresist processing, Optical proximity correction, Mask making, Semiconductors, Manufacturing, Computer simulations

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Mask fabrication results using new laser writing system: Sigma7300

Ho-June Lee, Dong-Suk Nam, Sang-Hee Lee, Hyun-Soo Kim, Jung-Hoon Lee, Hak-Seung Han, Byung-Gook Kim, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6283, 62831J (2006) https://doi.org/10.1117/12.681744

KEYWORDS: Photomasks, Particles, Inspection, Laser systems engineering, Mask making, SRAF, Printing, Semiconducting wafers, Light sources, Optical simulations

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Analysis of mask CD error by dose modulation for fogging effect

Hojune Lee, Seung-Hune Yang, Byung-Gook Kim, Sung-Yong Moon, Sung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557713

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Electron beams, Modulation, Monte Carlo methods, Optical testing, Optical simulations, Systems modeling, Laser scattering

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect

Hojune Lee, Seung-Hune Yang, Jin-Hong Park, Seong-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518283

KEYWORDS: Monte Carlo methods, Modulation, Etching, Critical dimension metrology, Photomasks, Scattering, Dry etching, Lithography, Cadmium, Error analysis

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Analytical approach to X-phenomenon in alternating phase-shifting masks

Jong Rak Park, Soon Ho Kim, Hojune Lee, Il-Yong Jang, Yo-Han Choi, Seung-Hune Yang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468092

KEYWORDS: Photomasks, Phase shifts, Error analysis, Semiconducting wafers, Fourier transforms, Reticles, Wafer-level optics, Convolution, Image acquisition, Holmium

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Yo-Han Choi, Jong-Rak Park, Moon-Gyu Sung, Seung-Hune Yang, Soon-Ho Kim, Ho-June Lee, Jeong-Yun Lee, Il-Yong Jang, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468099

KEYWORDS: Photomasks, Critical dimension metrology, Error analysis, Photoresist processing, Data modeling, Quantitative analysis, Chemically amplified resists, Integrated circuits, Semiconducting wafers, Etching

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years