Mr. Holger Hartung Profile

Holger Hartung

at Friedrich-Schiller-Univ Jena

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Author

Publications (5)

Proceedings Article | 13 March 2007 Paper

Optical and structural properties of waveguides in LiNbO3 fabricated by ultrashort laser pulses

J. Burghoff, H. Hartung, S. Nolte, A. Tünnermann

Proceedings Volume 6460, 64600W (2007) https://doi.org/10.1117/12.710865

KEYWORDS: Crystals, Waveguides, Ions, Refractive index, Polarization, Electro optics, Femtosecond phenomena, Diffusion, Nonlinear crystals, Annealing

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Proceedings Article | 20 October 2005 Paper

Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step

H. Hartung, T. Clausnitzer, E.-B. Kley, A. Tünnermann

Proceedings Volume 5965, 596505 (2005) https://doi.org/10.1117/12.625105

KEYWORDS: Photomasks, Diffraction, Holography, Near field, Scanning electron microscopy, Polarization, Electron beam lithography, Wave propagation, Lithography, Free space

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Proceedings Article | 20 October 2005 Paper

Novel fabrication technique of continuous profiles for microoptics and integrated optics

Thomas Käsebier, Holger Hartung, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 5965, 596504 (2005) https://doi.org/10.1117/12.625111

KEYWORDS: Photomasks, Binary data, Photoresist materials, Waveguides, Lithography, Fabrication, Optical lithography, Etching, Coating, Dry etching

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Proceedings Article | 3 November 2003 Paper

Resist hardening without surface deviation

Holger Hartung, Matthias Cumme, Mike Thieme, Ernst-Bernhard Kley, Andreas Tuennermann

Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.505797

KEYWORDS: Etching, Lithography, Silica, Chemical elements, Photomasks, Semiconductor lasers, Fabrication, Calibration, Beam shaping, Photoresist processing

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Proceedings Article | 9 November 2001 Paper

Thick refractive beam shaping elements applied to laser diodes

Matthias Cumme, Holger Hartung, Lars-Christian Wittig, Ernst-Bernhard Kley

Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448044

KEYWORDS: Beam shaping, Semiconductor lasers, Optical components, Lithography, Photomasks, Fabrication, Wave propagation, Surface roughness, Electron beams, Heat treatments

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