Focused ion beam (FIB) was employed to fabricate nanoimprint lithography stamps. Complex micro/nanopatterns were fabricated in the stamp, including curved nanograting structures. These micro/nanostructures were then replicated to SU-8 2000.1 resist, with an imprint temperature of 95 °C, which is lower than for conventional imprint polymers. Atomic force microscopy was used to characterize the surface profiles of stamp and replica's and the replication fidelity as well. The results show that nanoimprint with the FIB fabricated stamp can successfully replicate complex micro/nanostructures under low temperature in SU-8.
Focused Ion Beam (FIB) was employed to fabricate nanoimprint stamps. Complex three dimensional (3D) micro-nano
patterns were fabricated including the emblems of Beijing 2008 Olympic Games and Shanghai 2010 World Expo on a
single stamp. These micro/nano structures were then faithfully replicated to SU-8 2000.1 resist, with low imprint
temperature. Field emission-scanning electron microscope (FE-SEM) and atomic force microscopy (AFM) were used to
characterize both stamp and replica's surface profile and replication fidelity. The results show that nanoimprint with the
FIB fabricated stamps can successfully replicate complex 3D micro-nano SU-8 structures at the same time under low