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Hoon Namkung
at Hynix Semiconductor
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Publications (1)
Proceedings Article | 9 July 2015 Paper
The method of quartz damage recovery in the photomask repair process
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Defect detection, Silica, Quartz, Particles, Light scattering, Surface roughness, Distortion, Photomasks, Critical dimension metrology
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