Prof. Hoong-Joo Lee Profile

Prof. Hoong-Joo Lee

at SangMyung Univ

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Author

Publications (4)

Proceedings Article | 28 May 2004 Paper

Suppression of sidelobe and overlap error in AttPSM metal layer lithography using rule-based OPC

Hoong Joo Lee, Mi-Young Lee, Jun-Ha Lee

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534484

KEYWORDS: Metals, Scattering, Optical proximity correction, Lithography, Chromium, Photomasks, Printing, Resolution enhancement technologies, Phase shifts, Data processing

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Proceedings Article | 29 June 1998 Paper

Practical approach to control the full-chip-level gate CD in DUV lithography

Chul-Hong Park, Yoo-Hyon Kim, Hoong-Joo Lee, Jeong-Taek Kong, Sang-Hoon Lee

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310751

KEYWORDS: Optical proximity correction, Critical dimension metrology, Lithography, Logic devices, Deep ultraviolet, Photomasks, Convolution, Control systems, Instrument modeling, Photoresist processing

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Proceedings Article | 12 February 1997 Paper

Automatic gate CD control for a full-chip-scale SRAM device

Chul-Hong Park, Tae Kim, Hoong-Joo Lee, Jeong-Taek Kong, Sang-Hoon Lee

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301206

KEYWORDS: Critical dimension metrology, Optical proximity correction, Resolution enhancement technologies, Photomasks, Lithography, Semiconducting wafers, Automatic control, Control systems, Coherence (optics), Photoresist materials

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Proceedings Article | 12 February 1997 Paper

Three-dimensional electron-beam lithography simulator V2.0 for the gigabit-era photomask manufacturing

Yoo-Hyon Kim, Byung-Cheol Cha, Hoong-Joo Lee, Jung-Min Sohn, Jeong-Taek Kong, Sang-Hoon Lee

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301207

KEYWORDS: Photomasks, Manufacturing, Optical simulations, Monte Carlo methods, Scattering, Convolution, Lithography, 3D modeling, Electron beams, Scanning electron microscopy

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