Dr. Horst Schreiber Profile

Dr. Horst Schreiber

Technology Manager at Corning Incorporated

SPIE Involvement:

Author

Publications (23)

SPIE Journal Paper | 14 December 2022

Diffractive optical elements for calibration of LIDAR systems: materials and fabrication

Horst Schreiber, Xavier LaFosse, Jay J. Zhang, Paolo Batoni, Jared Stack, Jeff Gardner

OE, Vol. 62, Issue 03, 031206, (December 2022) https://doi.org/10.1117/12.10.1117/1.OE.62.3.031206

KEYWORDS: Diffractive optical elements, Calibration, LIDAR, Manufacturing, Silica, Materials processing, Projection systems, Etching, Diffraction gratings, Diffraction

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The promise of fully autonomous vehicles to replace the judgment of human drivers with real-time algorithmic decision-making based on optoelectronic systems relies fundamentally on the quality of the available data. Limitations imposed by sensor-resolution, available optical power, and achievable signal-to-noise ratios have been well studied in the light detection and ranging (LIDAR) application space. Additionally, the problem of integrating multiple sources of image data as well as the need to establish and maintain the system calibration over life are critically important to system reliability and safety. These latter concerns will receive even greater attention as self-driving vehicles begin to transition toward fully autonomous operation. Because of the importance of calibration to system performance and safety, the process of validating and recalibrating the system will ideally be integrated into the LIDAR system itself with calibration occurring automatically “anywhere and at any time,” without dedicated external infrastructure. Mass-market adoption is also being driven by the systems’ size and weight, as well as reliable manufacturability and resilience to environmental stresses. Due to their extreme stability, manufacturability, and small size, diffractive optical elements (DOEs) are well suited for use as optical calibration references. Current three-dimensional (3D) mapping systems based on structured light illumination already rely on DOEs as precision pattern generators to provide 3D depth sensing in a wide array mobile devices. We examine the potential use of DOEs as calibration elements in multicamera or LIDAR systems, including appropriate choices of materials, designs, and fabrication methods to ensure reliable long-term performance under automotive use conditions. We present simulations of the impact of DOE material properties on the accuracy of the generated dot patterns and consequently on the depth accuracy and lateral distortion of the 3D image. Additionally, we present requirements for DOE manufacture using conventional semiconductor fabrication technologies optimized for creating engineered surface nanostructures capable of transforming the output of a laser or other narrow-band source into a precise reference pattern.

Proceedings Article | 27 February 2019 Paper

Substrate requirements to enable durability and accuracy in structured-light-based 3D sensing

Horst Schreiber

Proceedings Volume 10914, 109140F (2019) https://doi.org/10.1117/12.2511888

KEYWORDS: Projection systems, Diffractive optical elements, Sensors, Temperature metrology, Diffraction gratings, Cameras, Laser imaging, Distortion, Diffraction, Silica

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Proceedings Article | 8 May 2018 Paper

Low auto-fluorescence broadband antireflection coatings for human genome sequencing optical platform

Jing Du, Jue Wang, Horst Schreiber, Jean Francois Oudard

Proceedings Volume 10627, 106270J (2018) https://doi.org/10.1117/12.2311319

KEYWORDS: Glasses, Optical coatings, Antireflective coatings, Imaging systems, Reflectivity, Objectives, Refractive index, Lens design, Thin film coatings

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Proceedings Article | 8 March 2016 Paper

Optical coherence tomography probe design for reduced artifact generation and manufacturability

Daniel Staloff, Lovell Comstock, William Miller, Horst Schreiber

Proceedings Volume 9697, 969731 (2016) https://doi.org/10.1117/12.2213107

KEYWORDS: Interfaces, Optical coherence tomography, Reflection, GRIN lenses, Mirrors, Reflectivity, Optics manufacturing, Polishing, Prototyping, Interferometers

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Proceedings Article | 7 March 2016 Paper

Novel light diffusing fiber for use in medical applications

W. Spencer Klubben, Stephan Logunov, Edward Fewkes, Jeff Mooney, Paul Then, Peter Wigley, Horst Schreiber, Kaitlyn Matias, Cynthia Wilson, Manuela Ocampo

Proceedings Volume 9702, 970218 (2016) https://doi.org/10.1117/12.2218267

KEYWORDS: Photodynamic therapy, Medical devices, Diffusion, Surgery, Diffusers, Phototherapy, Optical fibers, Light scattering, Glasses, Manufacturing

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Proceedings Article | 6 December 2011 Paper

HfO2/SiO2 enhanced diamond turned aluminum mirrors for IR laser optics

Jue Wang, Ronald Davis, Angela Wang, Horst Schreiber, Scott Wilkinson, Joseph Crifasi, Robert Felock

Proceedings Volume 8190, 819005 (2011) https://doi.org/10.1117/12.900226

KEYWORDS: Aluminum, Laser induced damage, Mirrors, Multilayers, Dielectrics, Scanning electron microscopy, Coating, Reflectivity, Particles, Diamond

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Proceedings Article | 21 May 2011 Paper

Low-loss dual-wave laser optics coatings at 1060 nm and 530 nm

Jue Wang, Horst Schreiber

Proceedings Volume 8016, 80160Y (2011) https://doi.org/10.1117/12.883915

KEYWORDS: Plasma, Optical coatings, Multilayers, Ions, Laser optics, Scanning electron microscopy, Reflectivity, Atomic force microscopy, Silica, Second-harmonic generation

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Proceedings Article | 20 December 2007 Paper

Extended lifetime of fluoride optics

Jue Wang, Colleen Clar, Horst Schreiber

Proceedings Volume 6720, 67200I (2007) https://doi.org/10.1117/12.753045

KEYWORDS: Surface finishing, Plasma, Ions, Magnetorheological finishing, Absorption, Fluorine, Polishing, Color centers, Coating, Excimer lasers

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Proceedings Article | 28 August 2006 Paper

Wavefront control of UV narrow bandpass filters prepared by plasma ion-assisted deposition

Jue Wang, Robert Maier, Horst Schreiber

Proceedings Volume 6286, 628604 (2006) https://doi.org/10.1117/12.677539

KEYWORDS: Plasma, Annealing, Ultraviolet radiation, Wavefronts, Refractive index, Optical coatings, Ions, Tantalum, Bandpass filters, Oxides

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Proceedings Article | 20 October 2005 Paper

Measuring wavefront tilt using shearing interferometry

Horst Schreiber

Proceedings Volume 5965, 59650Y (2005) https://doi.org/10.1117/12.625247

KEYWORDS: Wavefronts, Shearing interferometers, Interferometers, Spatial coherence, Interferometry, Modulation, Optical testing, Diffraction gratings, Ultraviolet radiation, Optical spheres

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Proceedings Article | 28 May 2004 Paper

Optical metrology for 193-nm immersion objective characterization

David Aronstein, Julie Bentley, Paul Dewa, Michael Dunn, Horst Schreiber, Thanh Nguyen, James Webb

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536383

KEYWORDS: Water, Objectives, Absorption, Optical spheres, Wavefronts, Interferometers, Liquids, Interferometry, Microscopes, Monochromatic aberrations

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Proceedings Article | 24 May 2004 Paper

Comparison of actinic lens characterization by aerial image evaluation and interferometric testing for 157-nm high-NA micro-objectives

Horst Schreiber

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533313

KEYWORDS: Interferometry, Calcium, Cameras, Wavefronts, Prisms, Interferometers, Dispersion, Modulation transfer functions, Objectives, Fiber optic illuminators

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Proceedings Article | 26 February 2004 Paper

System test for high-NA objectives at the 157-nm wavelength

Horst Schreiber

Proceedings Volume 5252, (2004) https://doi.org/10.1117/12.513480

KEYWORDS: Calcium, Cameras, Wavefronts, Prisms, Interferometry, Interferometers, Dispersion, Modulation transfer functions, Fiber optic illuminators, CCD cameras

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Proceedings Article | 30 July 2002 Paper

157-nm system test for high-NA lithographic lens systems

Horst Schreiber, Paul Dewa, K. Hanford, Robert Ligenza, Lisa Rich, Paul Tompkins

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474556

KEYWORDS: Wavefronts, Interferometers, Spatial coherence, Polarizers, Birefringence, Lithography, Polarization, Phase measurement, Oxygen, Interferometry

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Proceedings Article | 14 September 2001 Paper

Error separation technique for microlithographic lens testing with null configurations

Stephen Mack, Timothy Rich, James Webb, Paul Dewa, Horst Schreiber

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435669

KEYWORDS: Wavefronts, Monochromatic aberrations, Interferometers, Lithography, Fluorine, Optical fabrication, Optical testing, Calibration, Excimer lasers, Spherical lenses

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Lithographic lens systems are continually being designed to work at shorter wavelengths and higher numerical apertures. The prospect of 157 nm F₂ excimer-based lithography presents many demanding new challenges to lithographic lens manufacturers. Lens fabricators must re-orient themselves to handling and finishing more delicate optical materials such as calcium fluoride to unprecedented surface requirements. Thin film engineers are pressed to deliver a multitude of new optical coatings, but with a dramatically limited selection of raw materials. And optical test engineers are presented with new testing challenges: among them is at-wavelength interferometric testing of lithographic objectives using an F₂ excimer laser source. Requirements for constructing such an interferometer dictate a design containing several nitrogen-purged beam paths and a camera capable of detecting 157 nm radiation. These contribute to an interferometer that is cumbersome and expensive when applied to production testing of lithographic lens assemblies. In addition, complications emerge in the interferometer design due to the relatively poor coherence in the 157 nm F₂ excimer source. Fortunately, off-wavelength sources (usually at a 'user-friendly' longer wavelength) can be applied to transmitted wavefront testing of lithographic objectives designed for shorter wavelengths, while still providing nearly perfect and predictable at-wavelength imagery. This testing approach requires additional null optics to correct for off-wavelength spherochromatism effects. We have successfully used off-wavelength 248 nm interferometer testing to characterize 193 nm ArF lens systems, and this approach has been extended to the 157 nm regime by incorporating a well-characterized null corrector. We explain methods to perform null corrector characterization: We describe a technique to separate the non-rotationally symmetric errors introduced by a multi-element null corrector from the errors in the lithographic lens under test. We also discuss methods to characterize the rotationally symmetric errors introduced by this null corrector. In addition, we describe a method to cascade the error separation algorithm such that additional non-rotationally symmetric errors are also isolated. Test results are included and discussed.

Proceedings Article | 14 September 2001 Paper

157-nm Twyman-Green interferometer for lens testing

Bryan Statt, Paul Dewa, Stephen Mack, Horst Schreiber, Bryan Stone, Paul Tompkins

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435644

KEYWORDS: Interferometers, Mirrors, Lithography, Light sources, Wavefronts, Sensors, Reflectivity, Spherical lenses, Nitrogen, Relays

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Proceedings Article | 14 September 2001 Paper

Applications of a grating shearing interferometer at 157 nm

Horst Schreiber, Paul Dewa, Michael Dunn, Richard Hordin, Stephen Mack, Bryan Statt, Paul Tompkins

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435643

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Interferometers, Diffraction, Light sources, Spatial coherence, Collimation, Cameras, Beam shaping

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Proceedings Article | 12 October 1994 Paper

Reactive ion etching of microlens arrays into fused silica

Stefan Haselbeck, Martin Eisner, Horst Schreiber, Johannes Schwider

Proceedings Volume 2169, (1994) https://doi.org/10.1117/12.190220

KEYWORDS: Etching, Reactive ion etching, Photoresist materials, Silica, Microlens array, Microlens, Point spread functions, Modulation transfer functions, Glasses, Gases

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Proceedings Article | 15 December 1993 Paper

Production and control of refractive and diffractive microlenses

Johannes Schwider, Stefan Haselbeck, Horst Schreiber, Horst Sickinger, Oliver Falkenstoerfer, Norbert Lindlein, Andreas Zoeller, Helmut Haidner, Peter Kipfer, M. Heissmeier, Tuula Keinonen, John Sheridan, Sven Brinkmann, Norbert Streibl

Proceedings Volume 1992, (1993) https://doi.org/10.1117/12.165679

KEYWORDS: Lenses, Computer generated holography, Microlens, Diffraction, Wavefronts, Interferometers, Photoresist materials, Photomasks, Microscopes, Spherical lenses

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SPIE Journal Paper | 1 August 1993

New compensating four-phase algorithm for phase-shift interferometry

Johannes Schwider, Oliver Falkenstoerfer, Horst Schreiber, Andreas Zoeller, Norbert Streibl

OE, Vol. 32, Issue 08, (August 1993) https://doi.org/10.1117/12.10.1117/12.143340

KEYWORDS: Interferometry, Phase interferometry, Phase measurement, Interferometers, Information technology, Phase shifts, Error analysis, Glasses, Optical engineering, Algorithms

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SPIE Journal Paper | 1 June 1993

Microlenses fabricated by melting a photoresist on a base layer

Stefan Haselbeck, Horst Schreiber, Johannes Schwider, Norbert Streibl

OE, Vol. 32, Issue 06, (June 1993) https://doi.org/10.1117/12.10.1117/12.135845

KEYWORDS: Microlens, Photoresist materials, Glasses, Lenses, Mach-Zehnder interferometers, Liquids, Interferometry, Point spread functions, Modulation transfer functions, Spherical lenses

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Proceedings Article | 2 March 1993 Paper

Measurement of the wave aberrations of holographic optical lens elements

Oliver Falkenstoerfer, Johannes Schwider, Albrecht Boehm, Horst Schreiber

Proceedings Volume 1732, (1993) https://doi.org/10.1117/12.140389

KEYWORDS: Holographic optical elements, Holography, Interferometers, Point spread functions, Optical spheres, Optical components, Zernike polynomials, Modulation transfer functions, Diffraction, Calibration

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