Dr. Hsuen-Li Chen Profile

Dr. Hsuen-Li Chen

at National Taiwan Univ

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Author

Publications (15)

Proceedings Article | 5 May 2008 Paper

Using self-assembled nanoparticles to fabricate and optimize sub-wavelength textured structures in solar cells

Y. Lee, H. Chen, C. Yu, D. Wan

Proceedings Volume 7002, 70020X (2008) https://doi.org/10.1117/12.781279

KEYWORDS: Gold, Refractive index, Antireflective coatings, Nanoparticles, Etching, Solar cells, Silicon, Reflectivity, Wet etching, Semiconducting wafers

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Proceedings Article | 16 April 2008 Paper

Using optical thin film model to optimize thermal annealing procedure in P3HT:PCBM blend based solar cells

W. H. Lee, W. F. Su, H. L. Chen, T. H. Chen, S. Y. Chuang

Proceedings Volume 6999, 69991L (2008) https://doi.org/10.1117/12.781318

KEYWORDS: Thin films, Photovoltaics, Refractive index, Organic photovoltaics, Annealing, Solar cells, Crystals, Interfaces, Reflectivity, Absorption

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Proceedings Article | 5 December 2006 Paper

Using N-type organic material with photoconductivity for low-reflectance OLEDs

Kai-Hsiang Chuang, Hsuen-Li Chen, Cheng-Yu Li, Man-Kit Leung, Jiun-Haw Lee, Chun-Chieh Chao, Yu-Hsuan Ho

Proceedings Volume 6333, 63331Q (2006) https://doi.org/10.1117/12.682698

KEYWORDS: Reflection, Organic light emitting diodes, Metals, Silver, Reflectivity, Control systems, Organic materials, Aluminum, Destructive interference, Absorption

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Proceedings Article | 24 July 2002 Paper

Multi-layer bottom antireflective coating structures for high NA ArF exposure system applications

W. Fan, Tzyy-Jiann Wang, Tiao-Yuan Huang, Hsuen-Li Chen

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474184

KEYWORDS: Lithography, Antireflective coatings, Copper, Interfaces, Silicon, Reflectivity, Silicon films, Aluminum, Resolution enhancement technologies, Bottom antireflective coatings

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Proceedings Article | 16 July 2002 Paper

Metal characterization and process enhancement techniques for photolithographic materials

Hsuen-Li Chen, Fu-Hsiang Ko, Chun-Chen Hsu, Tieh-Chi Chu

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473512

KEYWORDS: Statistical analysis, Reflection, Metals, Reflectivity, Computer simulations, Mass spectrometry, Photoresist materials, Microwave radiation, Plasma, Bottom antireflective coatings

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SPIE Journal Paper | 1 April 2002

Novel bi-layer bottom antireflective coating structure for high-performance ArF lithography applications

Hsuen-Li Chen, W. Chao, Fu-Hsiang Ko, Tien-Chi Chu, Tiao-Yuan Huang

JM3, Vol. 1, Issue 01, (April 2002) https://doi.org/10.1117/12.10.1117/1.1447947

KEYWORDS: Reflectivity, Silicon, Deep ultraviolet, Aluminum, Lithography, Tolerancing, Bottom antireflective coatings, Absorption, Etching, Copper

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Proceedings Article | 19 October 2001 Paper

Multimode interference couplers using polymeric optical waveguides

Way-Seen Wang, Chih-Wei Hsu, Hsuen-Li Chen

Proceedings Volume 4579, (2001) https://doi.org/10.1117/12.444870

KEYWORDS: Waveguides, Etching, Polymers, Transmittance, Brain-machine interfaces, Reactive ion etching, Tolerancing, Anisotropic etching, Electro optic polymers, Polymer multimode waveguides

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Proceedings Article | 16 October 2001 Paper

Cladding layer for photonic integrated circuits

Tzyy-Jiann Wang, Way-Seen Wang, Hsuen-Li Chen, Chih-Wei Hsu, Yan Huang

Proceedings Volume 4603, (2001) https://doi.org/10.1117/12.444564

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Proceedings Article | 14 September 2001 Paper

Low-dielectric-constant FLARE 2.0 films as bottom antireflective coating layers for ArF lithography

Hsuen-Li Chen, Mei-Yi Li, Fu-Hsiang Ko, Tiao-Yuan Huang, Hsu-Chun Cheng, Tien-Chi Chu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435637

KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Dielectrics, Silicon, Reflectivity, Photomasks, Tantalum, Bottom antireflective coatings

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Proceedings Article | 5 September 2001 Paper

Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask application

Tien-Chi Chu, Tiao-Yuan Huang, Hsuen-Li Chen, Ben-Chang Chen, Fu-Hsiang Ko, Chien-Kui Hsu

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438347

KEYWORDS: Oxides, Antireflective coatings, Fabry–Perot interferometers, Deep ultraviolet, Reflection, Metals, Reflectivity, Photomasks, Binary data, Absorption

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Proceedings Article | 22 August 2001 Paper

Process development and impurities analysis for the bottom antireflective coating material

Hsu-Chun Cheng, Tiao-Yuan Huang, Fu-Hsiang Ko, Tieh-Chi Chu, Hsuen-Li Chen, Chu-Jung Ko

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436779

KEYWORDS: Refractive index, Statistical analysis, Reflection, Interfaces, Silicon, Coating, Photoresist materials, Microwave radiation, Semiconducting wafers, Bottom antireflective coatings

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Proceedings Article | 20 August 2001 Paper

Chemically amplified deep UV resists for electron-beam lithography applications

Hsuen-Li Chen, Tien-Chi Chu, Tiao-Yuan Huang, Jung-Yen Yang, Ben-Chang Chen, Chien-Kui Hsu, Fu-Hsiang Ko

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436705

KEYWORDS: Oxides, Lithography, Electron beam lithography, Electron beams, Optical lithography, Polymethylmethacrylate, Deep ultraviolet, Etching, Process control, Chemically amplified resists

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Proceedings Article | 26 July 1999 Paper

Silicon-oxynitride films prepared for 157-nm attenuated phase-shifting masks

Hsuen-Li Chen, L. Yeh, F. Lai, Lon Wang

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354314

KEYWORDS: Refractive index, Phase shifting, Etching, Sputter deposition, Silicon, Calcium, Semiconductor lasers, Photoresist materials, Silicon films, Phase shifts

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Proceedings Article | 25 June 1999 Paper

Simulation on a new reflection type attenuated phase-shifting mask for extreme ultraviolet lithography

Hsuen-Li Chen, Lon Wang

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351131

KEYWORDS: Reflectors, Multilayers, Phase shifting, Reflection, Germanium, Reflectivity, Photomasks, Extreme ultraviolet lithography, Phase shifts, Absorption

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Proceedings Article | 19 June 1998 Paper

Characteristics of fiber Bragg grating with deuterium loading

Hsuen-Li Chen, Chih-Wei Hsu, Lon Wang

Proceedings Volume 3420, (1998) https://doi.org/10.1117/12.312850

KEYWORDS: Optical fibers, Refractive index, Holography, Fiber Bragg gratings, Ultraviolet radiation, Annealing, Diffusion, Reliability, Reflectivity, Absorption

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Showing 5 of 15 publications

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