Dr. Hua-Yu Liu
Vice President, Computational Lithography Products at ASML Silicon Valley
SPIE Involvement:
Author
Publications (58)

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Personal protective equipment, Source mask optimization, Diffraction, Extreme ultraviolet, Line edge roughness, Stochastic processes, Extreme ultraviolet lithography, Resolution enhancement technologies, Photomasks, Critical dimension metrology

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Source mask optimization, Photomasks, Extreme ultraviolet, Scanners, Fiber optic illuminators, 3D modeling, Optimization (mathematics), Extreme ultraviolet lithography, Deep ultraviolet, Algorithm development

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Data modeling, Optical proximity correction, Calibration, Source mask optimization, Finite element methods, Photomasks, Semiconducting wafers, Logic, Electroluminescence, Lithography

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Calibration, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Data modeling, Extreme ultraviolet, Metrology, Optical proximity correction, Scanners

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: 3D modeling, Photomasks, Semiconducting wafers, Performance modeling, Diffusion, Lithography, Data modeling, Optical proximity correction, 3D image processing, Computer simulations

Showing 5 of 58 publications
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