Mr. Huaiyang Dou Profile

Huaiyang Dou

at Siemens EDA

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Publications (1)

Proceedings Article | 12 October 2021 Presentation + Paper

Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours

Kan Zhou, Xin Guo, Yinsheng Yu, Hongwen Zhao, Wenzhan Zhou, Yu Zhang, Ao Chen, Wenming Wu, Qijian Wan, Huaiyang Dou, Chunshan Du, Liguo Zhang, Germain Fenger

Proceedings Volume 11855, 118550E (2021) https://doi.org/10.1117/12.2601674

KEYWORDS: Photomasks, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Feature extraction, Critical dimension metrology, Metrology, OLE for process control, Image quality, Image processing

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