Huang Yang
at Institute of Optics and Electronics CAS
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 18 September 2014 Paper
Huang Yang, Hongwei Zhu, Tingwen Xing
Proceedings Volume 9282, 928233 (2014) https://doi.org/10.1117/12.2068275
KEYWORDS: Zernike polynomials, Lithography, Wavefronts, Manufacturing, 193nm lithography, Optics manufacturing, Wavefront aberrations, Code v, Optical design, Shape analysis

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