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Hung-Ming Kuo
at Taiwan Semiconductor Manufacturing Co. Ltd.
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Publications (1)
Proceedings Article | 2 April 2014 Paper
Phase shift focus monitor for OAI and high NA immersion scanners
H. Kuo, R. Peng, H. Liu
Proceedings Volume 9050, 905036 (2014) https://doi.org/10.1117/12.2054828
KEYWORDS: Calibration, Semiconducting wafers, Scanners, Optical lithography, Reticles, Phase shifts, Overlay metrology, Performance modeling, Diffraction, Photoresist processing
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