Hyemi Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Quartz, Particles, Image restoration, Chromium, Scanning electron microscopy, Photomasks, Deposition processes, Critical dimension metrology, Phase shifts

Proceedings Article | 16 September 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Defect detection, Image processing, Particles, Manufacturing, Inspection, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Defect inspection

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Etching, Air contamination, Image processing, Ions, Chromium, Oxygen, Transmission electron microscopy, Transmittance, Photomasks, Semiconducting wafers

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Refractive index, Optical lithography, Quartz, Laser scattering, Control systems, Printing, Ultrafast lasers, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Defect detection, Scanners, Manufacturing, Inspection, Image transmission, Bridges, Photomasks, Critical dimension metrology, Semiconducting wafers

Showing 5 of 8 publications
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