Mr. Hyun Jin Kim Profile

Hyun Jin Kim

Managing Director at Dongjin Semichem Co Ltd

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 16 April 2011 Paper

Study of major factors to affect photoresist profile on developable bottom anti-reflective coating process

Hyo Jung Roh, Dong Kyu Ju, Hyun Jin Kim, Jaehyun Kim

Proceedings Volume 7972, 79721Q (2011) https://doi.org/10.1117/12.879581

KEYWORDS: Photoresist materials, Polymers, Photoresist developing, Critical dimension metrology, Bottom antireflective coatings, Lithography, Reflectivity, Double patterning technology, Etching, Temperature metrology

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Proceedings Article | 26 March 2008 Paper

Development of new BARC for immersion process using hyper NA

Hyo Jung Roh, Man Ho Han, Sang Jeoung Kim, Hyun Jin Kim, Jaehyun Kim, Keun Kyu Kong, Ki Lyoung Lee, Sung Koo Lee, Dong Heok Park

Proceedings Volume 6923, 69232T (2008) https://doi.org/10.1117/12.776801

KEYWORDS: Reflectivity, Etching, Refractive index, Semiconductors, Photoresist processing, Polymers, Lithography, Photorefractive polymers, Photoresist materials, Materials processing

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Proceedings Article | 23 March 2007 Paper

Effect of deprotection activation energy on lithographic performance of EUVL resist

Sang-Jeoung Kim, Geun-Jong Yu, Jung-Yeol Lee, Hyun-Jin Kim, Jae-Woo Lee, Deog-Bae Kim, Yool Kang, Jaehyun Kim

Proceedings Volume 6519, 651947 (2007) https://doi.org/10.1117/12.711951

KEYWORDS: Polymers, Line edge roughness, Lithography, Diffusion, Extreme ultraviolet lithography, Molecules, Image resolution, Photoresist processing, Reflectivity, Image processing

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Proceedings Article | 12 June 2003 Paper

Effects of quencher ability on profile in chemically amplified resist system

Deogbae Kim, Hyun-Jin Kim, Sook-Hee Cho, Dong-Hwal Lee, Kwang-Hyi Im, Min-Ja Yoo, Sang-Hyang Lee, Jaehyun Kim, Jin-Soo Kim, Hyeong-Soo Kim

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485161

KEYWORDS: Diffusion, Lithography, Polymers, Silicon, Line edge roughness, Chemically amplified resists, Photoresist processing, Semiconducting wafers, Coating, Etching

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Proceedings Article | 24 July 2002 Paper

Insertion effects of various acid sensitive groups into acetal-type polymer on the profile of 248-nm chemically amplified resist

Yoon-Sik Chung, Hyun-Jin Kim, Sook Cho, Dong Lee, Kwang Im, Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474266

KEYWORDS: Polymers, Line edge roughness, Carbonates, Lithography, Interfaces, Hydrogen, Molecules, Annealing, Diffusion, Chemically amplified resists

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Proceedings Article | 24 July 2002 Paper

Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene (P(HS-TBA-CBPS)) on the profiles of 248 n

Hyun-Jin Kim, Yoon-Sik Chung, Dong Lee, Sook Cho, Kwang Im, Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474265

KEYWORDS: Polymers, Lithography, Line edge roughness, Polymerization, Transmittance, Scanning electron microscopy, Etching, Manganese, Chemically amplified resists, Edge roughness

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Proceedings Article | 24 August 2001 Paper

Investigation on dissolution rate effect of newly prepared polystyrene copolymer on the profiles of DUV resists

Hyun-Jin Kim, Yoon-Sik Chung, Yong-Jun Choi, Yang-Sook Kim, Deog-Bae Kim

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436885

KEYWORDS: Polymers, Ions, Lithography, Deep ultraviolet, Photoresist processing, Semiconductors, Manufacturing, Polymerization, Diffusion, Chemical analysis

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Showing 5 of 7 publications

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