Hyun-Jong Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Photomasks, Extreme ultraviolet, Double patterning technology, Source mask optimization, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electronics, Image segmentation, Manufacturing, Electroluminescence, Inverse problems, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics)

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Data modeling, Calibration, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

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