Mr. Hyung-Do Kim Profile

Hyung-Do Kim

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 4 December 2008 Paper

CD uniformity improvement for 3x nm node devices

Chang-Min Park, Hyun-Byuk Kim, Hyung-Do Kim, Hyun-Woo Kim, Cheol-Hong Kim, Joo-On Park, Doohoon Goo, Jeongho Yeo, Seong-Woon Choi, Woo-Sung Han, Min-Su Choi, Sung-Woo Hwang

Proceedings Volume 7140, 714024 (2008) https://doi.org/10.1117/12.804627

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Double patterning technology, Lithography, Etching, Semiconductors, Control systems, Spatial resolution, Transistors

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Proceedings Article | 14 May 2004 Paper

Realization of sub-80nm small space patterning in ArF photolithography

Si-Hyun Kim, Hyung-Do Kim, Si-Hyeung Lee, Chang-Min Park, Man-Hyoung Ryoo, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536340

KEYWORDS: Photoresist processing, Optical lithography, Resolution enhancement technologies, Lithography, Semiconducting wafers, Etching, Optical proximity correction, Chemical reactions, Critical dimension metrology, Materials processing

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Proceedings Article | 28 August 2003 Paper

Extension of Cr-less PSM to sub-90-nm node DRAM and logic device

Ju-Hyung Lee, Hyung-Do Kim, Dong-Hoon Chung, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504280

KEYWORDS: Photomasks, Nanoimprint lithography, Logic, Phase shifts, Lithography, Manufacturing, Scanners, Semiconducting wafers, Logic devices, Scanning electron microscopy

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Proceedings Article | 12 June 2003 Paper

What an antishrinkage coating method can surmount among stumbling block of ArF resists

Hyung-Do Kim, Si-Hyeung Lee, Sang-Jun Choi, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485120

KEYWORDS: Coating, Polymers, Line edge roughness, Etching, Scanning electron microscopy, Lithography, Photoresist processing, Reliability, Resistance, Electron beams

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Proceedings Article | 30 July 2002 Paper

Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world

Insung Kim, Sung-gon Jung, Hyung-Do Kim, Gisung Yeo, In-Gyun Shin, Junghyun Lee, Hanku Cho, Joo-Tae Moon

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474595

KEYWORDS: Transmittance, Lithography, Photomasks, Nanoimprint lithography, Electroluminescence, Scanners, Image transmission, Optical lithography, Image quality, Roads

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Proceedings Article | 5 September 2001 Paper

Prediction of MEEF using a simple model and MEEF enhancement parameters

Dong-Hoon Chung, Seung-Hune Yang, Hyung-Do Kim, In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438343

KEYWORDS: Photomasks, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Optical lithography, Image enhancement, Image processing, Diffusion, Semiconductors, Mask making

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Showing 5 of 6 publications

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