CONFERENCE PROCEEDINGS
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Hyung-Joo Lee
at SAMSUNG Electronics Co Ltd
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Author
Publications (5)
Proceedings Article | 10 May 2016 Paper
The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information
Won Joo Park, Hyung-Joo Lee, Yoon Taek Han, Seuk Hwan Choi, Hak Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Yoshiaki Ogiso, Soichi Shida, Jun Matsumoto, Takayuki Nakamura
Proceedings Volume 9984, 998407 (2016) https://doi.org/10.1117/12.2242496
KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Metrology, Image processing, Statistical analysis, Image quality, Neodymium, Semiconductors, Optical proximity correction
Proceedings Article | 28 July 2014 Paper
Novel CD-SEM measurement methodology for complex OPCed patterns
Hyung-Joo Lee, Won Joo Park, Seuk Hwan Choi, Dong Hoon Chung, Inkyun Shin, Byung-Gook Kim, Chan-Uk Jeon, Hiroshi Fukaya, Yoshiaki Ogiso, Soichi Shida, Takayuki Nakamura
Proceedings Volume 9256, 92560D (2014) https://doi.org/10.1117/12.2069368
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Metrology, Semiconductors, Error analysis, Optical proximity correction, Reliability, Tolerancing, Lithography
Proceedings Article | 9 September 2013 Paper
Mask automation: need a revolution in mask makers and equipment industry
Proceedings Volume 8880, 888016 (2013) https://doi.org/10.1117/12.2025569
KEYWORDS: Photomasks, Manufacturing, Control systems, Process control, Semiconductors, Semiconducting wafers, Telecommunications, Wafer manufacturing, Mask making, Extreme ultraviolet
Proceedings Article | 30 October 2007 Paper
2D measurement using CD SEM for arbitrarily shaped patterns
Hyung-Joo Lee, So-Yoon Bae, Dong-Hoon Chung, Sang-Gyun Woo, HanKu Cho, Jun Matsumoto, Takayuki Nakamura, Dong Il Shin, TaeJun Kim
Proceedings Volume 6730, 673037 (2007) https://doi.org/10.1117/12.746453
KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Semiconducting wafers, Resolution enhancement technologies, Edge detection, Semiconductors, Optical metrology, Detection and tracking algorithms, Lithography
Proceedings Article | 12 June 2003 Paper
Simulation of complex resist pattern collapse with mechanical modeling
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485048
KEYWORDS: Liquids, Calibration, Interfaces, Solids, Analytical research, Chemical analysis, Optical lithography, Critical dimension metrology, Lithography, Adhesives
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