Dr. Hyung Rae Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Polymers, Photoresist materials, Lithography, Photoresist developing, Nitrogen, Particle swarm optimization, Polymerization, Photoresist processing, Scanning electron microscopy, Etching

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Photoresist processing, Semiconducting wafers, Reflectivity, Optical proximity correction, Lithography, Photomasks, Line edge roughness, Process control, Critical dimension metrology, Etching

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Polarization, Line edge roughness, Optical lithography, Semiconducting wafers, Diffraction, Fiber optic illuminators, Fourier transforms, Critical dimension metrology, Lithography, Reticles

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Critical dimension metrology, Oxides, Reflectivity, Lithography, Semiconducting wafers, Photomasks, Chemical mechanical planarization, Silicon, Control systems, Etching

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Etching, Line width roughness, Lithography, Silicon, Dry etching, Photomasks, Photoresist processing, Semiconducting wafers, Chemistry, Optical lithography

Showing 5 of 7 publications
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